Properties of fluoride DUV excimer laser optics: influence of the number of dielectric layers

Arens, Winfried; Ristau, Detlev; Ullmann, J.; Zaczek, Christoph; Thielsch, Roland; Kaiser, Norbert; Duparré, Angela; Apel, Oliver; Mann, Klaus; Lauth, Hans; Bernitzki, Helmut; Ebert, Johanes; Schippel, S.; Heyer, H.

doi:10.1117/12.379314

Cited by 7 publications

(8 citation statements)

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“…Table 4 summarizes the rms roughnesses obtained from the measurements at different scan sizes along with the resulting effective rms roughnesses ͑ rms, eff ͒. As expected, the measurements show a gradual increase in roughness with increasing num- 4 This result can be expected on the basis of the mechanical and structural properties exhibited by IBS fluoride coatings ͑high packing density, low inhomogeneity, compressive stress͒. 2,5 The PSD functions sustain these observations and complement the information on the microstructure of the IBS coatings.…”

Section: Roughness Characterizationmentioning

confidence: 73%

“…When we compare the values in Table 6 with the scattering levels of samples with the same design and deposited onto substrates with similar characteristics but with conventional evaporation techniques, 4 two different tendencies are observed depending on the number of layers. For the coatings with designs S-L, S-H, S-L-H, and S-L-H-L, the scattering of the IBS samples is smaller than that of samples produced by evaporation.…”

Section: ϫ5mentioning

confidence: 99%

“…That is why such process requires use of reactive deposition conditions by means of introducing supplementary fluorine species during deposition. Initially and for near-UV applications 7 the reactive gas used was CF 4 . For the present purpose, diluted fluorine was preferred for limiting the carbon contamination of the films, which can induce undesirable absorption at 193 nm.…”

Section: Deposition and Optical Characterization Of The Coatingsmentioning

confidence: 99%

“…[1][2][3] The achievement of optimized coatings for these components constitutes one of the major challenges, as problems arise that are minor at larger wavelengths. 4,5 Absorption and scattering losses of the layers are critical obstacles that compromise coating performance. Key issues for minimizing these losses consist of a careful selection of the most appropriate coating materials and fine tuning of the deposition processes.…”

Section: Introductionmentioning

confidence: 99%

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Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm

Ferré‐Borrull¹,

Duparré²,

Quesnel³

2000

Appl. Opt.

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Scattering characteristics of multilayer fluoride coatings for 193 nm deposited by ion beam sputtering and the related interfacial roughnesses are investigated. Quarter-and half-wave stacks of MgF 2 and LaF 3 with increasing thickness are deposited onto CaF 2 and fused silica and are systematically characterized. Roughness measurements carried out by atomic force microscopy reveal the evolution of the power spectral densities of the interfaces with coating thickness. Backward-scattering measurements are presented, and the results are compared with theoretical predictions that use different models for the statistical correlation of interfacial roughnesses.

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Section: Roughness Characterizationmentioning

confidence: 73%

Section: ϫ5mentioning

confidence: 99%

Section: Deposition and Optical Characterization Of The Coatingsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm

Ferré‐Borrull¹,

Duparré²,

Quesnel³

2000

Appl. Opt.

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show abstract

“…Many years of expertise in the research and development of optical coatings [14][15] enable high transmission anti-reflection coatings from the DUV to the NIR. ZEISS has developed specially adapted coating processes (Ion beam sputtering, ion-assisted deposition and so on) for maintaining the micro-structure of blazed gratings in particular [13].…”

Section: Icso 2014 Tenerife Canary Islands Spain International Confmentioning

confidence: 99%

Space applications: monolithic diffraction grating elements from EUV to NIR spectral range

Gatto

Pesch

Erdmann

et al. 2017

International Conference on Space Optics — ICSO 2014

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Monolithic diffraction gratings are one of the key components of high sensitive spectral imaging systems including spectrometer used in space instruments. These gratings are optimized for high efficiency, lowest line spacing errors and low scattering values to improve the performance of a spectral imaging system. Spectral imaging systems lead to enhanced remote sensing properties when the sensing system provides sufficient spectral resolution to identify materials from its spectral reflectance signature comprising low signal-to-noise ratios.

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Monolithic diffraction grating elements for remote sensing applications

et al. 2014

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A diffraction grating is one of the key-components of spectral imaging spectrometers. Spectral imaging systems lead to enhanced remote sensing properties when the sensing system provides sufficient spectral resolution to identify materials from its spectral reflectance signature. The performance of diffraction gratings provide an initial way to improve instrumental resolution. Thus, subsequent manufacturing techniques of high quality gratings are essential to significantly boost spectral performance. ZEISS has developed advanced fabrication techniques to manufacture monolithic, high groove density gratings with low stray light, high diffraction efficiency and low polarization sensitivity characteristic. Gratings at ZEISS can be generated holographically in combination with ion beam plasma etching to enhance the grating profile or made by using gray-scale laser lithography technology. Holographic recording in combination with plasma etching enable the fabrication of various grating profiles to optimize efficiency including polarization behavior. Typical profile shapes are blazed type gratings, sinusoidal profiles and binary profiles allowing to optimize efficiency and polarization requirements exactly towards the required spectral range. Holographic gratings can be fabricated on plane and curved (convex, concave or free-form shape) substrates. As grating manufacturing techniques continue to cope with the challenges of enhanced remote sensing capabilities, ZEISS also can pattern large-area diffraction gratings with high resolution in the visible and shortwave infrared by using gray-scale lithography.

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Properties of fluoride DUV excimer laser optics: influence of the number of dielectric layers

Cited by 7 publications

References 0 publications

Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm

Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm

Space applications: monolithic diffraction grating elements from EUV to NIR spectral range

Monolithic diffraction grating elements for remote sensing applications

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