Abstract:Epitaxial graphene of uniform thickness prepared on SiC is of great interest for various applications. On the Si-face, large area uniformity has been achieved, and there is a general consensus about the graphene properties. A similar uniformity has yet not been demonstrated on the C-face where the graphene has been claimed to be fundamentally different. A rotational disorder between adjacent graphene layers has been reported and suggested to explain why multilayer C-face graphene show the p-band characteristic… Show more
“…At present, there exist several interpretations about the rotational disorder on this system. Several groups reported that the disorder is due to the rotation between graphene layers inside one single domain [14,15], the Bernal stacked azimuthally disordered graphene domains [12,[22][23][24], or a combination of AB stacked and twisted multilayers [26]. We now present our results obtained from graphene with different thicknesses measured by classical and nano photoelectron spectroscopies.…”
Section: Resultsmentioning
confidence: 84%
“…Based on theoretical calculations, renormalization of the Fermi velocity near the Dirac point is expected for very small twist angles [20,21]. On the other hand, Johansson and co-workers [12,22,23] have conducted μ-LEED and x-ray photoemission electron microscopy (XPEEM) studies that enabled them to measure single graphene domains on the C-face. The results showed the coexistence of micrometersized domains of single and multilayer graphene with different azimuthal orientations and no twisted layers within the grains.…”
Graphene samples with thicknesses ranging from monolayer to few layer graphene grown on the C-face of SiC by Si flux-assisted molecular beam epitaxy were studied to understand their stacking structure. Particular attention was put on determining the size, thickness, spatial distribution, and orientation relative to the SiC of the graphene domains. A complete electronic characterization of the graphene films down to submicrometer grains was obtained by using synchrotron-based conventional and nanoresolved photoelectron spectroscopies. These measurements were completed with scanning probe techniques like atomic force and scanning tunneling microscopies. By probing exactly the same region of the samples using angular-resolved and core-level photoelectron spectroscopy imaging and point modes, we were able to identify two types of grains constituting the graphene films with radically different thickness, stacking and orientation. The size, distribution, and registry with the substrate for each type of grain were determined. Most interestingly, we have evidenced that multilayer graphene grains with Bernal stacking coexist with areas composed of twisted bilayer graphene grains.
“…At present, there exist several interpretations about the rotational disorder on this system. Several groups reported that the disorder is due to the rotation between graphene layers inside one single domain [14,15], the Bernal stacked azimuthally disordered graphene domains [12,[22][23][24], or a combination of AB stacked and twisted multilayers [26]. We now present our results obtained from graphene with different thicknesses measured by classical and nano photoelectron spectroscopies.…”
Section: Resultsmentioning
confidence: 84%
“…Based on theoretical calculations, renormalization of the Fermi velocity near the Dirac point is expected for very small twist angles [20,21]. On the other hand, Johansson and co-workers [12,22,23] have conducted μ-LEED and x-ray photoemission electron microscopy (XPEEM) studies that enabled them to measure single graphene domains on the C-face. The results showed the coexistence of micrometersized domains of single and multilayer graphene with different azimuthal orientations and no twisted layers within the grains.…”
Graphene samples with thicknesses ranging from monolayer to few layer graphene grown on the C-face of SiC by Si flux-assisted molecular beam epitaxy were studied to understand their stacking structure. Particular attention was put on determining the size, thickness, spatial distribution, and orientation relative to the SiC of the graphene domains. A complete electronic characterization of the graphene films down to submicrometer grains was obtained by using synchrotron-based conventional and nanoresolved photoelectron spectroscopies. These measurements were completed with scanning probe techniques like atomic force and scanning tunneling microscopies. By probing exactly the same region of the samples using angular-resolved and core-level photoelectron spectroscopy imaging and point modes, we were able to identify two types of grains constituting the graphene films with radically different thickness, stacking and orientation. The size, distribution, and registry with the substrate for each type of grain were determined. Most interestingly, we have evidenced that multilayer graphene grains with Bernal stacking coexist with areas composed of twisted bilayer graphene grains.
“…The remaining C forms a graphene film on the surface. However, the surface reconstructions and growth kinetics for each polar surface are different, resulting in different graphene growth rates, growth morphologies and electronic properties [30,[73][74][75]. Yakimova et al have analyzed the conditions for large-area graphene formation on SiC substrate [21].…”
Section: Graphitization Process Of Sic Polytypesmentioning
This review is devoted to one of the most promising two-dimensional (2D) materials, graphene. Graphene can be prepared by different methods and the one discussed here is fabricated by the thermal decomposition of SiC. The aim of the paper is to overview the fabrication aspects, growth mechanisms, and structural and electronic properties of graphene on SiC and the means of their assessment. Starting from historical aspects, it is shown that the most optimal conditions resulting in a large area of one ML graphene comprise high temperature and argon ambience, which allow better controllability and reproducibility of the graphene quality. Elemental intercalation as a means to overcome the problem of substrate influence on graphene carrier mobility has been described. The most common characterization techniques used are low-energy electron microscopy (LEEM), angle-resolved photoelectron spectroscopy (ARPES), Raman spectroscopy, atomic force microscopy (AFM) in different modes, Hall measurements, etc. The main results point to the applicability of graphene on SiC in quantum metrology, and the understanding of new physics and growth phenomena of 2D materials and devices.
“…Graphene is atomic layer of sp 2 -hybridized carbon atoms covalently bonded in a honeycomb lattice via three in-plane σ-bonds and a remaining dangling π-bond EG grown on semi-insulating silicon carbide (SiC) substrates has a high potential for integration in the existing planar electronic devices technologies. While growth of graphene on the C-face (0001) of SiC substrates is difficult to control, the Si-face (0001) provides high quality, homogenous monolayer (ML) and bilayer (BL) graphene at a wafer scale, due to a self-consistent nature of the growth process [3][4][5]. Prototype devices based on EG have been demonstrated [6][7][8][9].…”
Development of silicon based electronics have revolutionized our every day life during the last three decades. Nowadays Si based devices operate close to their theoretical limits that is becoming a bottleneck for further progress. In particular, for the growing field of high frequency and high power electronics, Si cannot offer the required properties. Development of materials capable of providing high current densities, carrier mobilities and high breakdown fields is crucial for a progress in state of the art electronics. Epitaxial graphene grown on semi-insulating silicon carbide substrates has a high potential to be integrated in the current planar device technologies. High electron mobilities and sheet carrier densities make graphene extremely attractive for high frequency analog applications. One of the remaining challenges is the interaction of epitaxial graphene with the substrate. Typically, much lower free charge carrier mobilities, compared to free standing graphene, and doping, due to charge transfer from the substrate, is reported. Thus, a good understanding of the intrinsic free charge carriers properties and the factors affecting them is very important for further development of epitaxial graphene. III-group nitrides have been extensively studied and already have proven their high efficiency as light sources for short wavelengths. High carrier mobilities and breakdown electric fields were demonstrated for III-group nitrides, making them attractive for high frequency and high power applications. Currently, In-rich InGaN alloys and AlGaN/GaN high electron mobility structures are of high interest for the research community due to open fundamental questions. Electrical characterization techniques, commonly used for the determination of free charge carrier properties, require good ohmic and Schottky contacts, which in certain cases can be difficult to achieve. Access to electrical properties of buried conductive channels in multilayered structures requires modification of samples and good knowledge of the electrical properties of all electrical contact within the structure. Moreover, the use of electrical contacts to electrically characterize two-dimensional electronic materials, such as graphene, can alter their intrinsic properties. Furthermore, the determination of effective mass parameters commonly employs cyclotron resonance and Shubnikov-de Haas oscillations measurements, which require long scattering times of free charge carriers, high magnetic fields and low temperatures. The optical Hall effect is an external magnetic field induced optical anisotropy in conductive layers due to the motion of the free charge carriers under the influence of the Lorentz force, and is equivalent to the electrical Hall effect at optical frequencies. The optical Hall effect can be measured by generalized ellipsometry and provides a powerful method for the determination of free charge carrier properties in a non-destructive and contactless manner. In principle, a single optical Hall effect measurement can provide quan...
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