“…For the growth of the bulk films of GaAsN, InGaAsN, and GaAsSbN, the reactor pressure was 150 Torr and the growth temperature 600 1C, as measured by an in-situ pyrometer. Previously, we reported that either higher growth temperature or the use of TrisSb antimony precursor, instead of TMSb, gives rise to a significant decrease in the carbon background contamination in GaAsSbN materials [9]. Highresolution X-ray diffraction (HR-XRD) ω -2θ rocking curves around the (004) and (311) reflection for (100) and (311)B substrates, respectively, were used to characterize the out-ofplane lattice constant of the InGaAsN, and GaAsSbN films, which were nominally lattice-matched to GaAs substrates (Δa/ao 0.3%).…”