1978
DOI: 10.1116/1.569728
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Projection ion lithography with aperture lenses

Abstract: This paper reports on experiments in projection ion lithography in which multiple demagnified images have been etched directly into a substrate through an aperture lens array, without using a resist or proximity mask. The ion source is an 8-cm-beam-diam, Kaufman-type mercury ion thruster, which accelerates ions through a grid of perforated plates, and then neutralizes the resultant beamlets by injecting electrons at ground potential. The neutralized ion beam is allowed to pass through a suitable mask and thenc… Show more

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Cited by 7 publications
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“…85. We see that for larger, more irregular cracks (where the assumption of the theory that the diameter of the crack is less than 1/4 wavelength is not well satisfied), the error between theory and experiment increases.…”
Section: Low Frequency Measurementsmentioning
confidence: 94%
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“…85. We see that for larger, more irregular cracks (where the assumption of the theory that the diameter of the crack is less than 1/4 wavelength is not well satisfied), the error between theory and experiment increases.…”
Section: Low Frequency Measurementsmentioning
confidence: 94%
“…68, 80, 99, 109, 112, 192, 200, 251/t 398, 498-500. efficiency, 202 forces, 62,65,68,78,85,86,99 hardness, 66 530 SUBJECT INDEX (continued) models, 1,71,103,191 rates, 42,192,[204][205][206]216 The proceedings contain forty of forty-three research papers, together with floor discussions, presented at the Symposium. Specific topics covered include: L) mechanisms of abrasive machining and surface finishing; 2) technology of machining md surface finishing; 3) characterization of machined surfaces; and 4) effects of machining on the properties of ceramics.…”
Section: Resultsmentioning
confidence: 99%
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