1997
DOI: 10.1557/proc-484-135
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Progress on GaInAsSb And InAsSbP Photodetectors for MiD-Infrared Wavelengths

Abstract: Progress on mid-infrared photodetectors fabricated by the liquid phase epitaxial growth of GaInAsSb, InAsSbP, and AlGaAsSb on GaSb and InAs substrates is reported. GaInAsSb p/n and p-i-n detectors, InAsSbP p/n detectors and AlGaAsSb/GaInAsSb avalanche photodiode (APD) structures were fabricated. Preliminary results indicate that these devices can have higher detectivity with lower cooling requirements than commercially available detectors in the same wavelength range. Infrared p/n junction detectors made from … Show more

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Cited by 6 publications
(4 citation statements)
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“…The availability of ternary InGaSb virtual substrates has a promising potential for developing high performance detectors, without the influence of the binary substrates usually used for processing the ternary materials [3]. Many articles reported different device structures using materials such as InGaAsSb and AlGaAsSb [4][5][6][7][8][9][10] including APDs [11][12][13] and phototransistors [14]. Such devices usually involve much complicated structures with difficult material processing.…”
Section: Introductionmentioning
confidence: 99%
“…The availability of ternary InGaSb virtual substrates has a promising potential for developing high performance detectors, without the influence of the binary substrates usually used for processing the ternary materials [3]. Many articles reported different device structures using materials such as InGaAsSb and AlGaAsSb [4][5][6][7][8][9][10] including APDs [11][12][13] and phototransistors [14]. Such devices usually involve much complicated structures with difficult material processing.…”
Section: Introductionmentioning
confidence: 99%
“…InGaAsSb is a promising semiconductor for developing high gains 2 µm detectors. Several articles discussed the properties of this material and its application in p-n photodiode and APD fabrication [12][13][14][15][16][17][18][19][20][21][22][23][24][25][26] . The APD design most widely employed uses separate absorption and multiplication (SAM) layers.…”
Section: Introductionmentioning
confidence: 99%
“…InGaAsSb is a promising semiconductor for developing high gain 2 µm detectors. Several articles discussed the properties of this material and its application in APD fabrication using the separate absorption and multiplication (SAM) structure [8][9][10][11][12][13][14][15][16] . Electron and hole impact ionization coefficients were evaluated and multiplication factors of 10-20 and 50-100 were achieved at 296 and 78 K, respectively, by Andreev et al [8][9][10] .…”
Section: Introductionmentioning
confidence: 99%
“…Voronina et al studied the mobility of charge carriers in InGaAsSb and its dependence on both the doping concentration and the temperature 13 . Development of p-n, pin and SAM APD structures were discussed by Shellenbarger et al using the same material [14][15][16] . Spectral response profile dependence on frontal and backward illumination of the devices has been investigated by the same group.…”
Section: Introductionmentioning
confidence: 99%