2020
DOI: 10.3390/electronics9050864
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Programming Pulse Width Assessment for Reliable and Low-Energy Endurance Performance in Al:HfO2-Based RRAM Arrays

Abstract: A crucial step in order to achieve fast and low-energy switching operations in resistive random access memory (RRAM) memories is the reduction of the programming pulse width. In this study, the incremental step pulse with verify algorithm (ISPVA) was implemented by using different pulse widths between 10 μ s and 50 ns and assessed on Al-doped HfO 2 4 kbit RRAM memory arrays. The switching stability was assessed by means of an endurance test of 1k cycles. Both conductive levels and voltages needed … Show more

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Cited by 28 publications
(19 citation statements)
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“…The MIM structures have an area of about 0.4 µm 2 . The endurance and retention of these devices has been studied in order to show the viability of this technology both for memory and neuromorphic applications [11,33,34]. The algorithms employed to program the conductive levels on the devices are writeverify approaches.…”
Section: Device Fabrication and Measurement Set-up A Multilevel Approachmentioning
confidence: 99%
“…The MIM structures have an area of about 0.4 µm 2 . The endurance and retention of these devices has been studied in order to show the viability of this technology both for memory and neuromorphic applications [11,33,34]. The algorithms employed to program the conductive levels on the devices are writeverify approaches.…”
Section: Device Fabrication and Measurement Set-up A Multilevel Approachmentioning
confidence: 99%
“…Here, a pulse width of 1 µs was chosen. The pulse width has an influence on the necessary switching voltage as well as cell variability [19]. A pulse width of 1 µs is a compromise between programming speed and the necessary pulse height for programming.…”
Section: Simulation Resultsmentioning
confidence: 99%
“…Basically, low-resistance state (LRS) and high-resistance state (HRS) can be converted according to the applied voltage, and the state, once stored, has a nonvolatile characteristic that is maintained over time [4][5][6][7]. Among a lot of materials, metal oxides like TiO 2 , HfO 2 and Ta 2 O 5 are the most popular resistive switching materials due to their superior memory device behaviors, such as endurance, stability, repeatability, and reproducibility [8][9][10][11][12][13][14][15]. Regarding the resistive change switching effect of metal oxide-based RRAM devices, various mechanisms are known, depending on the resistive switching materials and the electrodes [16].…”
Section: Introductionmentioning
confidence: 99%