Production of separation-nozzle systems for uranium enrichment by a combination of X-ray lithography and galvanoplastics

Backer, E.; Ehrfeld, W.; Münchmeyer, D.; Betz, H.; Heuberger, A.; Pongratz, S.; Glashauser, W.; Michel, H.; Siemens, R. v.

doi:10.1007/bf00463495

Cited by 184 publications

(69 citation statements)

References 3 publications

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“…LIGA (or lithographie galvanoformung abformung) is a process for making high-aspect-ratio structures in metal by combining X-ray lithography for patterning a sensitive polymer and a galvanoplastic method. [6,7] Because X-ray lithography is expensive, a UV radiation source is used in place of X-rays in the UV-LIGA process. SU8 components are well-known and widely used for MEMS (microelectromechanical systems), fluidic and packaging applications, and also as masters for microinjection molding.…”

Section: Introductionmentioning

confidence: 99%

Conductive SU8 Photoresist for Microfabrication

et al. 2005

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Section: Introductionmentioning

confidence: 99%

Conductive SU8 Photoresist for Microfabrication

et al. 2005

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“…LIGA was initially developed in 1982 for the fabrication of micron-sized separation nozzles for nuclear power production applications in Germany [46] . The name is actually derived from the German acronym for 'X-ray lithographie galvanoformung abformung', which means X-ray lithography, electrodeposition, and molding.…”

Section: Ligamentioning

confidence: 99%

Introduction to MEMS

Tai

2012

Microsystems and Nanotechnology

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The first research on MEMS can be traced all the way back to the 50's [1] . In the 80's, there was a burst of MEMS using semiconductor materials. In the 90's, MEMS was formally an emerging technology. Today, MEMS has grown to be a big field with hectic international competition on many commercial applications. Without doubt, MEMS is already ubiquitous, but various new MEMS devices are continuing to show up. There is no end in sight as we continue to see MEMS branch into new fields and applications. At the same time, though, there is still much to do with both science and technology issues because of its 'multidisciplinary' and 'system' nature. MEMS is becoming more exciting than ever considering its bright long-term prospects going into BioMEMS and NEMS. There is no doubt that MEMS will be a key factor for bridging our world into nanotechnology. The best day for MEMS is yet to come with a continuous drive to make our life smaller, cheaper, and better.

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“…Developed in the early 1980s by a team under the leadership of Becker and Ehrfeld [1], X-ray lithography demonstrated the fabrication of highly 2.5-dimensional structures with aspect ratios as high as 100:1. Combined with electroplating and known under the acronym X-ray LIGA (Lithographie, Galvanoformung and Abformung), this technique has been used in many research projects, but only on a limited scale for industrial applications.…”

Section: Introductionmentioning

confidence: 99%

UV-LIGA: From Development to Commercialization

Genolet¹,

Lorenz²

2014

Micromachines

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A major breakthrough in UV-LIGA (Lithographie, Galvanoformung and Abformung) started with the use of epoxy-based EPON ® SU-8 photoresist in the mid-1990s. Using this photoresist has enabled the fabrication of tall and high aspect ratio structures without the use of a very expensive synchrotron source needed to expose the photoresist layer in X-ray LIGA. SU-8 photoresist appeared to be well-suited for LIGA templates, but also as a permanent material. Based on UV-LIGA and SU-8, Mimotec SA has developed processes to manufacture mold inserts and metallic components for various market fields. From one to three-level parts, from Ni to other materials, from simple to complicated parts with integrated functionalities, UV-LIGA has established itself as a manufacturing technology of importance for prototyping, as well as for mass-fabrication. This paper reviews some of the developments that led to commercial success in this field.

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Production of separation-nozzle systems for uranium enrichment by a combination of X-ray lithography and galvanoplastics

Cited by 184 publications

References 3 publications

Conductive SU8 Photoresist for Microfabrication

Conductive SU8 Photoresist for Microfabrication

Introduction to MEMS

UV-LIGA: From Development to Commercialization

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