Production of Nb thin film by ECR sheet plasma

Shibata, Kanetoshi; Ito, Hiroaki; Yugami, Noboru; Miyazaki, Tadaomi; Nishida, Yasushi

doi:10.1016/s0040-6090(00)01668-0

Cited by 12 publications

(3 citation statements)

References 4 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…在等离子体发生装置中, 由于电子的运动速度远大于离子, 器壁上会累积大量负电荷, 正电荷则会聚集在器壁附近形成正空间电荷层, 这个非中性区域被称为等离子体鞘层 [1] , 其厚度相当于十几个电子德拜长度. 自1929年Langmuir [2] 首次提出鞘层概念以来, 鞘层就成为等离子体物理学中的一个重要研究热点, 其特性广泛应用于各行业, 如等离子体材料表面改性 [3][4][5] 、探针测量 [6] 、薄膜沉积 [7] 和离子体蚀刻 [8][9][10] 等方面, 等离子体鞘层中的电场分布、带电粒子的密度分布、鞘层厚度以及入射到待加工工件表面上的粒子能量分布等都直接影响等离子体蚀刻和膜沉积的工艺质量 [11,12] .…”

Section: 引言unclassified

Multi-ion magnetized sheath properties with non-extensive electron distribution

Chen,

Tan,

Cui

et al. 2024

Acta Phys. Sin.

View full text Add to dashboard Cite

Plasma magnetized sheath plays an important role in semiconductor processing, material surface modification, film deposition and so on. In plasma experiments and discharge applications, multi-ion plasmas consisting of more than two kinds of ions often exist. For long range interacting plasma systems, non-Maxwellian electrons can be described by the non-extensive distribution of Tsallis. In this paper, a fluid model with one-dimensional spatial coordinates and three-dimensional velocity coordinates is established for the multi-ion plasma sheath. It is assumed that the electron velocity in the sheath follows a non-extensive distribution, and the background helium ions and different kinds of impurity ions are magnetized in a magnetic field with a certain tilt Angle. The effects of non-extensive parameters, impurity ions and oblique magnetic field on the number density, velocity, wall potential and kinetic energy of ions in the multi-ion magnetic sheath were investigated by numerical simulation. The results show that in the helium-hydrogen or helium-argon mixed plasma sheath, the ionic velocity along the vertical wall direction decreases with the increase of the non-extensive parameters, the number density of ions and electrons in the sheath decreases, the sheath thickness decreases, and the kinetic energy of ions at the wall decreases. When the concentration of impurity ions increases, the kinetic energy of ions on the wall is independent of the type of ions. With the increase of magnetic field intensity, the number density of helium ions and the velocity along the vertical wall fluctuate along the sheath edge, and the fluctuation amplitude increases with the decrease of non-extensive parameters, while the heavy ions have no obvious fluctuation. In addition, the effects of the types and concentrations of impurity ions on the related properties of the sheath were also analyzed. With the increase of the magnetic field intensity, the number density and the velocity along the vertical wall direction fluctuate at the sheath edge, and the fluctuation amplitude increases with the decrease of the non-extensive parameter, whereas there are no significant fluctuations for heavy ions. In addition, when impurity ions are heavy ions, the absolute value of wall potential increases with the increase of impurity ion concentration and the decrease of non-extensibility parameters, and the kinetic energy of background ions increases at the wall surface. When the impurity ion is a light ion, the absolute value of the wall potential decreases with the increase of the impurity ion concentration and the decrease of the non-extensibility parameter, and the kinetic energy of the background ion at the wall decreases.

show abstract

Section: 引言unclassified

Multi-ion magnetized sheath properties with non-extensive electron distribution

Chen,

Tan,

Cui

et al. 2024

Acta Phys. Sin.

View full text Add to dashboard Cite

show abstract

“…Among the many physical characteristics of plasma discharges, the plasma sheath stands out as a critical component in most plasma experiments and industrial processes, and due to its complicated and variable structure, attempts to construct and simulate physical models of the plasma sheath have attracted widespread interest and research over the past decades [1][2][3][4][5][6][7][8][9][10]. Generally, when a plasma is adjacent to the container wall or material surface, a region of potential inhomogeneity is an inevitable result, since the ions have a substantially higher mass than the electrons and the electron mobility is at least two orders of magnitude greater than that of the ions, which results in the accumulation of negative charges on the wall and a negative potential in comparison to the bulk plasma.…”

Section: Introductionmentioning

confidence: 99%

“…As a non-neutral transition region, the plasma sheath is closely related to various chemical and physical processes. A thorough examination of the sheath properties is essential for understanding the interactions between the plasma and wall in industrial processes such as thin film deposition, surface modification, plasma etching, sputtering, microelectronics, spacecraft propulsion, fusion energy, etc [4][5][6][7][8][9][10].…”

Section: Introductionmentioning

confidence: 99%

Modeling of magnetized collisional plasma sheath with nonextensive electron distribution and ionization source

Chen¹,

Yang²,

An³

et al. 2023

Plasma Sci. Technol.

View full text Add to dashboard Cite

The properties of atmospheric pressure collisional plasma sheath with non-extensively distributed electrons and hypothetical ionization source terms are studied in this work. The Bohm criterion for the magnetized plasma was extended in the presence of an ion-neutral collisional force and ionization source. The effects of electron non-extensive distribution, ionization frequency, ionneutral collision, magnetic field angle and ion temperature on the Bohm criterion of the plasma sheath are numerically analyzed. The fluid equations are solved numerically in the plasma-wall transition region using a modified Bohm criterion as the boundary condition. The plasma sheath properties such as charged particle density, floating sheath potential and thickness are thoroughly investigated under different kinds of ion source terms, the contributions of collisions, and magnetic fields. The results show that the effect of the ion source term on the properties of atmospheric pressure collisional plasma sheath is significant. As the ionization frequency increases, the Mach number of Bohm criterion decreases and the range of possible values narrows. When the ion source is considered, the space charge density increases, the sheath potential drops more rapidly, and the sheath thickness becomes narrower. In addition, ion-neutral collision, magnetic field angle and ion temperature also significantly affect the sheath potential profile and sheath thickness.

show abstract

Behaviour of sheath in electronegative warm plasma

Dhawan

Malik

2020

J Theor Appl Phys

View full text Add to dashboard Cite

Production of Nb thin film by ECR sheet plasma

Cited by 12 publications

References 4 publications

Multi-ion magnetized sheath properties with non-extensive electron distribution

Multi-ion magnetized sheath properties with non-extensive electron distribution

Modeling of magnetized collisional plasma sheath with nonextensive electron distribution and ionization source

Behaviour of sheath in electronegative warm plasma

Contact Info

Product

Resources

About