Advances in Resist Technology and Processing XIV 1997
DOI: 10.1117/12.275841
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Process effects resulting from an increased BARC thickness

Abstract: Process improvements attributed to the use of bottom anti-reflective coatings (B.A.R.C.s) are well documented. As our experience with these materials improves, so does our understanding of additional optimization. Recent supplier experiments suggest an increase in the thickness of AZ® BARLi (bottom anti-reflective layer i-line) solution to reduce photoresist swing curve ratios. Also, changes in thin film stack on common substrates can adversely affect the degree of photoresist reflective notching. It is theref… Show more

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“…Resist image defects, including both reflective notching and thin film interference effects, are commonly observed as finer resolution features are obtained, caused by back reflected light from substrate topography. One way to eliminate these image defects is to introduce a bottom antireflection coating (BARC) [1][2][3][4] between the substrate and resist, as shown in Figure 1. This coating can be applied by a spin-casting procedure, similar to that used to apply the resist.…”
Section: Antireflection Coatingsmentioning
confidence: 99%
“…Resist image defects, including both reflective notching and thin film interference effects, are commonly observed as finer resolution features are obtained, caused by back reflected light from substrate topography. One way to eliminate these image defects is to introduce a bottom antireflection coating (BARC) [1][2][3][4] between the substrate and resist, as shown in Figure 1. This coating can be applied by a spin-casting procedure, similar to that used to apply the resist.…”
Section: Antireflection Coatingsmentioning
confidence: 99%