Bis(2-(oxiran-2-ylmethyl)-1,3-dioxoisoindolin-5-yl) carbonate and polymers containing 9-anthracenylmethylmethacrylate (AMMA), p-tert-butoxy styrene (PTBS), and methacrylic acid (MAA) monomeric units were synthesized with the aim of developing a novel photo-patternable crosslinked epoxy system. The oxirane groups in bis(2-(oxiran-2-ylmethyl)-1,3-dioxoisoindolin-5-yl) carbonate were reacted with the carboxylic acid in the polymer to generate a crosslinked epoxy film, and the photo degradation of the crosslinked film was achieved through decomposition of the carbonate groups in the cross-linked film by deep UV irradiation. Because the copolymer containing anthracene groups has relatively high reflective index and absorption at 248 nm, this cross-linked system can be applied to patternable bottom antireflective coating materials for deep UV lithography applications.