2016
DOI: 10.1063/1.4953829
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Probing Purcell enhancement in plasmonic nanoantennas by broadband luminescent Si quantum dots

Abstract: Colloidal silicon quantum dots (Si QDs) with a very broad photoluminescence (PL) band are proposed as a probe to monitor the Purcell enhancement in a plasmonic nanostructure. Si QDs placed on an arbitrary plasmonic nanostructure enable us to determine the Purcell enhancement factors in a broad spectral range (600–900 nm). As a proof-of-concept experiment, a layer of Si QDs is spin-coated on gold film-over nanosphere structures, and the Purcell enhancement is quantitatively determined from the analyses of the P… Show more

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Cited by 7 publications
(5 citation statements)
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“…To control the gap length precisely, we employ a monolayer of a colloidal solution of silicon (Si) QDs of 3.0 nm in diameter. ,, By controlling the number of QD monolayers from 0 to 4, the gap length is varied from 0 to 12 nm (see Figure S2 in the Supporting Information). In this work, the QD monolayers work not only as the dielectric spacer but also as a stable fluorophore to monitor the Purcell effect in the gap resonator . An advantage to use Si QDs as a fluorophore is the very broad luminescence band with a full width at half-maximum (fwhm) more than 300 meV, which allows us to monitor the Purcell effect in a wide wavelength range.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…To control the gap length precisely, we employ a monolayer of a colloidal solution of silicon (Si) QDs of 3.0 nm in diameter. ,, By controlling the number of QD monolayers from 0 to 4, the gap length is varied from 0 to 12 nm (see Figure S2 in the Supporting Information). In this work, the QD monolayers work not only as the dielectric spacer but also as a stable fluorophore to monitor the Purcell effect in the gap resonator . An advantage to use Si QDs as a fluorophore is the very broad luminescence band with a full width at half-maximum (fwhm) more than 300 meV, which allows us to monitor the Purcell effect in a wide wavelength range.…”
Section: Resultsmentioning
confidence: 99%
“…28 In this work, the QD monolayers work not only as the dielectric spacer but also as a stable fluorophore to monitor the Purcell effect in the gap resonator. 37 An advantage to use Si QDs as a fluorophore is the very broad luminescence band with a full width at halfmaximum (fwhm) more than 300 meV, 37 which allows us to monitor the Purcell effect in a wide wavelength range. Finally, a diluted colloidal solution of Au nanorods (45 nm in diameter and 125 nm in length; transmission electron microscope image in Figure 3a) is dropped to finalize the NRoM structure.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…Nanosphere lithography (NSL), which uses a self-aligned 2-dimensional array of polystyrene or silica spheres as a template for the formation of metal nanostructures, is one of the high-throughput and low-cost processes to produce metal nanostructures on a large substrate without using expensive equipment. [17][18][19][20][21][22][23][24][25] A template of a sphere array is also used in a metal film over nanosphere (FON) process, in which a relatively thick metal film is deposited on the sphere array to produce metal nanostructures. 22,23,25 Similar to the FON process, a metal film is deposited on a structured substrate fabricated by nanoimprint lithography (NIL) to produce metal nanostructures.…”
Section: Introductionmentioning
confidence: 99%
“…15 Furthermore, by tuning the surface plasmon resonance wavelength to the emission wavelength of Si-QDs, Purcell enhancement of the emission rate has been reported. [16][17][18][19] In previous studies on surface plasmon enhanced emission of QDs, metal nanostructures have been produced by several different methods. [20][21][22][23][24] The most widely used process is electron-beam lithography, 12,13,25 which is suitable for the proof-of-concept experiments due to the high accuracy of the fabrication process, although it is very costly.…”
Section: Introductionmentioning
confidence: 99%
“…[20][21][22][23][24] The most widely used process is electron-beam lithography, 12,13,25 which is suitable for the proof-of-concept experiments due to the high accuracy of the fabrication process, although it is very costly. Another often used process is nanosphere lithography, 14,15,18 which uses a two-dimensional array of spheres as a template for the formation of metal nanostructures. Although the process is simple and does not require expensive setups for the formation of metal nanostructures, the freedom of the design, and thus the tunability of the surface plasmon resonance wavelength, is limited.…”
Section: Introductionmentioning
confidence: 99%