Prevention of electric breakdown during ion bombardment of organic insulators using a cluster ion beam

Hirata, Koichi; Saitoh, Yoichi; Narumi, K.; Kobayashi, Yoshinori

doi:10.1063/1.1520336

Cited by 18 publications

(12 citation statements)

References 15 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…This was discovered early on by Appelhans and Delmore (1987) and has been confirmed several times since in both organic and polymeric samples (Hirata et al, 2002(Hirata et al, , 2003. With C þ 60 , charge compensation is often not required, even in the dynamic SIMS mode (Xu et al, 2004;Cheng & Winograd, 2005).…”

Section: B Decreased Chargingmentioning

confidence: 79%

“…It has been repeatedly shown that employing cluster sources can eliminate charging (Appelhans & Delmore, 1987;Hirata et al, 2002Hirata et al, , 2003Xu et al, 2004;Cheng & Winograd, 2005). This was discovered early on by Appelhans and Delmore (1987) and has been confirmed several times since in both organic and polymeric samples (Hirata et al, 2002(Hirata et al, , 2003.…”

Section: B Decreased Chargingmentioning

confidence: 82%

See 1 more Smart Citation

Cluster secondary ion mass spectrometry of polymers and related materials

Mahoney

2009

Mass Spectrometry Reviews

283

329

View full text Add to dashboard Cite

Cluster secondary ion mass spectrometry (cluster SIMS) has played a critical role in the characterization of polymeric materials over the last decade, allowing for the ability to obtain spatially resolved surface and in-depth molecular information from many polymer systems. With the advent of new molecular sources such as C(60)(+), Au(3)(+), SF(5)(+), and Bi(3)(+), there are considerable increases in secondary ion signal as compared to more conventional atomic beams (Ar(+), Cs(+), or Ga(+)). In addition, compositional depth profiling in organic and polymeric systems is now feasible, without the rapid signal decay that is typically observed under atomic bombardment. The premise behind the success of cluster SIMS is that compared to atomic beams, polyatomic beams tend to cause surface-localized damage with rapid sputter removal rates, resulting in a system at equilibrium, where the damage created is rapidly removed before it can accumulate. Though this may be partly true, there are actually much more complex chemistries occurring under polyatomic bombardment of organic and polymeric materials, which need to be considered and discussed to better understand and define the important parameters for successful depth profiling. The following presents a review of the current literature on polymer analysis using cluster beams. This review will focus on the surface and in-depth characterization of polymer samples with cluster sources, but will also discuss the characterization of other relevant organic materials, and basic polymer radiation chemistry.

show abstract

Section: B Decreased Chargingmentioning

confidence: 79%

Section: B Decreased Chargingmentioning

confidence: 82%

Cluster secondary ion mass spectrometry of polymers and related materials

Mahoney

2009

Mass Spectrometry Reviews

283

329

View full text Add to dashboard Cite

show abstract

“…Cluster ion impact on a target produces different secondary ion emission yields compared with those for monoatomic ions because of the unique irradiation phenomenon that the constituent atoms of an incident cluster simultaneously impact on a very small region of the target surface [1][2][3][4][5]. As higher emission yields of secondary ions useful for surface analysis have been observed for various combinations of cluster ions and targets, several attempts have been made to apply cluster ion beams to primary ions for secondary ion mass spectroscopy [6,7].…”

Section: Introductionmentioning

confidence: 99%

Development of secondary ion mass spectroscopy using medium energy C60 ion impact

Hirata

Saitoh

Chiba

et al. 2008

Nuclear Instruments and Methods in Physics Research Section B:

Self Cite

View full text Add to dashboard Cite

“…6,7 Cluster ion bombardment provides nonlinear irradiation effects on secondary emissions, [8][9][10] which lead to a charge accumulation process that differs from the process for monoatomic ions. 11 In our previous work, we compared monoatomic ion C 1 ϩ versus cluster ion C 8 ϩ bombardments on the charge accumulation processes of an organic insulator by simultaneously measuring the target and secondary emission currents as functions of atomic dose. 11 We found that the electric breakdown caused by charge accumulation during the ion bombardment can be avoided by using cluster ions instead of monoatomic ions.…”

mentioning

confidence: 99%

“…11 In our previous work, we compared monoatomic ion C 1 ϩ versus cluster ion C 8 ϩ bombardments on the charge accumulation processes of an organic insulator by simultaneously measuring the target and secondary emission currents as functions of atomic dose. 11 We found that the electric breakdown caused by charge accumulation during the ion bombardment can be avoided by using cluster ions instead of monoatomic ions. 11 This advantage of cluster ions arises from a lower absolute charging potential that stems from charged secondary emission phenomena occurring in cluster ion impact.…”

mentioning

confidence: 99%

Time-of-flight secondary ion mass spectroscopy for surface analysis of insulators using a cluster ion beam

Hirata

Saitoh

Chiba

et al. 2003

Applied Physics Letters

Self Cite

View full text Add to dashboard Cite

Articles you may be interested inSecondary ion counting for surface-sensitive chemical analysis of organic compounds using time-of-flight secondary ion mass spectroscopy with cluster ion impact ionization Rev. Sci. Instrum. 82, 033101 (2011); 10.1063/1.3541799 Time-of-flight secondary ion mass spectroscopy analysis of Na adatoms interacting with water-ice film J. Chem. Phys. 125, 044706 (2006); 10.1063/1.2216692 Highly sensitive time-of-flight secondary-ion mass spectroscopy for contaminant analysis of semiconductor surface using cluster impact ionization Appl. Phys. Lett. 86, 044105 (2005); 10.1063/1.1852715Time-of-flight secondary ion mass spectrometry depth profiling of multiple quantum well II-VI semiconductors using negative cluster ions Surface composition and morphology of polyimidesiloxane copolymers with short polydimethylsiloxane segments studied by electron spectroscopy for chemical analysis and time-of-flight secondary ion mass spectrometry

show abstract

Prevention of electric breakdown during ion bombardment of organic insulators using a cluster ion beam

Abstract: Ion and electron bombardment-related ion emission during the analysis of diamond using secondary ion mass spectrometry

Cited by 18 publications

References 15 publications

Cluster secondary ion mass spectrometry of polymers and related materials

Cluster secondary ion mass spectrometry of polymers and related materials

Development of secondary ion mass spectroscopy using medium energy C60 ion impact

Time-of-flight secondary ion mass spectroscopy for surface analysis of insulators using a cluster ion beam

Contact Info

Product

Resources

About