PREVAIL — Evolution and properties of large area reduction projection electron optics

Evolution of electron projection optics from variable axis immersion lenses to projection reduction exposure with variable axis immersion lenses

“…2 This means that the inner diameters of the lens pole pieces and deflectors have to be adequately large particularly in the vicinity of the reticle, making it practically impossible to avoid significant field overlap. 10 The results for distortionx/y ϭ12/6 nm deflected/undeflected ͑measuring tool repeatablity 6 nm͒-are also in reasonable agreement with the theory, predicting x/y Ϸ9/5 nm. 6.…”

Application of the generalized curvilinear variable axis lens to electron projection

“…[1][2][3][4][5][6][7][8] It has been explained that the need to constrain the detrimental impact on performance of Coulomb interactions between the electrons led to the concept of the curvilinear variable axis ͑CVA͒ within the encompassing lens doublet ͑CVAL͒ system. Also, the rationale of being intuitive and practical to set up has been given for choosing in POC the special case of a CVA, which is restricted to a meridianal plane and follows the radial component r b of the off-axis fundamental imaging ray w b 9 of the lens doublet without deflectors.…”

Process development of electron beam lithography in an academic environment

“…One such system, offered by Leica Microsystems, is designed specifically for EBL and is capable of processing multiple wafers per hour [3]. A second system, developed by the IBM Microelectronics Division working jointly with the Nikon Corporation also developed a system using an approach called Projection Reduction Exposure with Variable Axis Immersion Lenses (PREVAIL) [4], with the purpose of high volume throughput. These systems are very expensive and require in depth knowledge of their operation by engineers and production operators using the tools.…”