2006
DOI: 10.1143/jjap.45.7565
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Present Status and Future Prospect of Widegap Semiconductor High-Power Devices

Abstract: High-power device technology is a key technological factor for wireless communication, which is one of the information network infrastructures in the 21st century, as well as power electronics innovation, which contributes considerably to solving the energy saving problem in the future energy network. Widegap semiconductors, such as SiC and GaN, are strongly expected as high-power high-frequency devices and high-power switching devices owing to their material properties. In this paper, the present status and f… Show more

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Cited by 295 publications
(191 citation statements)
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“…While keeping the merits of conventional Schottky-gate-based HFETs, i.e., a high density of two-dimensional electron gas ͑2DEG͒ at the AlGaN/GaN interface, high cutoff and maximum frequencies, and the thermal and chemical stability of AlGaN and GaN, MISHFETs offer many advantages over HFETs, such as lower gate leakage current, higher breakdown voltage, better thermal stability of the gate, mitigation of current collapse, a wider range of gate voltage sweep, and higher maximum drain current and output power. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17] These features are crucial for applications in high-power, high-temperature electronics, 7,17 particularly to realize low on-resistance and normally off highpower FETs. 15,18 Although the standard high frequency capacitancevoltage ͑C-V͒ measurement at room temperature ͑RT͒ is usually done on metal/insulator/semiconductor heterostructure ͑MISH͒ capacitors and/or metal/semiconductor heterostructure ͑MSH͒ Schottky diodes before the fabrication and characterization of the MISHFET devices, the C-V data are often used only to estimate the thicknesses of the insulator film and/or the AlGaN layer 1,4,12,16,19 or to calculate the 2DEG density.…”
Section: Introductionmentioning
confidence: 99%
“…While keeping the merits of conventional Schottky-gate-based HFETs, i.e., a high density of two-dimensional electron gas ͑2DEG͒ at the AlGaN/GaN interface, high cutoff and maximum frequencies, and the thermal and chemical stability of AlGaN and GaN, MISHFETs offer many advantages over HFETs, such as lower gate leakage current, higher breakdown voltage, better thermal stability of the gate, mitigation of current collapse, a wider range of gate voltage sweep, and higher maximum drain current and output power. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17] These features are crucial for applications in high-power, high-temperature electronics, 7,17 particularly to realize low on-resistance and normally off highpower FETs. 15,18 Although the standard high frequency capacitancevoltage ͑C-V͒ measurement at room temperature ͑RT͒ is usually done on metal/insulator/semiconductor heterostructure ͑MISH͒ capacitors and/or metal/semiconductor heterostructure ͑MSH͒ Schottky diodes before the fabrication and characterization of the MISHFET devices, the C-V data are often used only to estimate the thicknesses of the insulator film and/or the AlGaN layer 1,4,12,16,19 or to calculate the 2DEG density.…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, they permit the operation of devices at higher voltages, temperatures, and frequencies, 12 making it possible to reduce volume and weight in a wide range of applications. This could lead to large energy savings in industrial and consumer appliances, accelerate widespread use of electric vehicles and fuel cells, and help integrate renewable energy into the electric grid.…”
Section: Applications and Fi Gures Of Meritmentioning
confidence: 99%
“…These requirements have led to great interest in power devices based on wide gap semiconductors such as GaN and SiC [1] [2] [3]. The main advantage of wide gap semiconductors is their very high electric field capability.…”
Section: Introductionmentioning
confidence: 99%