Preparatory Study for the Matrix-Pattern Imaging, EB System

Tanimoto, Sayaka; Someda, Yasuhiro; Okumura, Masahide; Ohta, Hiroya; Sohda, Yasunari; Saitou, Norio

doi:10.1143/jjap.42.6672

Cited by 11 publications

(8 citation statements)

References 1 publication

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“…To create multiple beams, different methods are available. In the single column approach, multiple beams are created either by using multiple sources [4][5][6] or by using a single source that is split into multiple beamlets using apertures. [7][8][9][10][11][12] Multiple sources are either photocathodes or cold field emitter arrays.…”

Section: -11mentioning

confidence: 99%

Multibeam scanning electron microscope: Experimental results

Gheidari

Hagen

Kruit

2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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The authors present the first results obtained with their multibeam scanning electron microscope. For the first time, they were able to image 196 ͑array of 14ϫ 14͒ focused beams of a multielectron beam source on a specimen using single beam scanning electron microscope ͑SEM͒ optics. The system consists of an FEI Novanano 200 SEM optics column equipped with a multielectron beam source module. The source module consists of the multibeam source and an accelerator lens. In the multibeam source, the wide angle beam of a high brightness Schottky source is divided into 196 beamlets and focused by an aperture lens array. The accelerator lens is positioned on the image plane of the multibeam source to direct the beams toward the SEM column. The array of source images is further imaged by the SEM magnetic lenses, and the beam opening angle is defined at the variable aperture of the SEM. The system is designed to deliver 14ϫ 14 arrays of beamlets with a minimum probe size of 1 nm. In this article, the performance of the system is examined for a fixed magnification case.

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Section: -11mentioning

confidence: 99%

Multibeam scanning electron microscope: Experimental results

Gheidari

Hagen

Kruit

2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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“…However, in order to enhance the throughput, one could write with many electron beams in parallel. Several authors have proposed and/or built such multibeam lithography systems, [7][8][9][10][11][12][13][14][15][16][17][18][19][20] which can be divided roughly into four types: (i) multiple optical columns with multiple sources, [10][11][12] (ii) single column with multiple sources, [13][14][15] (iii) single column with single source, [16][17][18][19][20][21][22] and (iv) multiple cold field emitters in close proximity to the wafer. 23 Although the latter system seems attractive, because it does not require any optics, it has not been demonstrated yet.…”

Section: Introductionmentioning

confidence: 99%

Parallel electron-beam-induced deposition using a multi-beam scanning electron microscope

Post

Gheidari

Hagen

et al. 2011

Journal of Vacuum Science & Technology B, Nanotechnology an

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Lithography techniques based on electron-beam-induced processes are inherently slow compared to light lithography techniques. The authors demonstrate here that the throughput can be enhanced by a factor of 196 by using a scanning electron microscope equipped with a multibeam electron source. Using electron-beam induced deposition with MeCpPtMe 3 as a precursor gas, 14 Â 14 arrays of Pt-containing dots were deposited on a W/Si 3 N 4 /W membrane, with each array of 196 dots deposited in a single exposure. The authors demonstrate that by shifting the array of beams over distances of several times the beam pitch, one can deposit rows of closely spaced dots that, although originating from different beams within the array, are positioned within 5 nm of a straight line.

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“…Multi-electron-beam systems are roughly divided into three types: multicolumn with multisource, 1-3 single column with multisource, [4][5][6] and single column with single source. 7-12 In a multicolumn system, each beam has its own optics, and its position and optical property can be calibrated.…”

Section: Introductionmentioning

confidence: 99%

Optical properties of a multibeam column with a single-electron source

Kamimura

Tanimoto

Ohta

et al. 2007

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Electron and ion optical design software for integrated circuit manufacturing equipmentA novel single-column multi-electron-beam system, called a beam-split array, has been developed for a high-resolution, high-throughput lithography tool. In this system, a single electron beam is divided into 1024 beams by a multisource module ͑MSM͒ composed of an aperture array ͑a beam-dividing aperture͒, a static lens array ͑Einzel lenses for each divided beam͒, and a blanker array ͑BLA, blanking electrode pairs for each focused beam͒. The MSM is used to form multiple intermediate images of the electron source at the BLA. These images are demagnified to form final images through a projection optics consisting of a double lens doublet with a blanking aperture and deflector. To align the multiple beam paths in the MSM, aligners between these arrays are used, and the aligner conditions are determined by monitoring the blanking-aperture image. Moreover, because each beam current is about 0.1% of the total beam current on the specimen, a high-contrast transmission detection method is used to detect the electrons at the final image plane. As a result, 1024 point beams are successfully formed. In the final image, the measured beam size is less than 55 nm, and the displacement due to distortion is less than 56 nm, even on the off-axial beams. In addition, individual beam blanking by BLA is verified, and cross-talk at the BLA is confirmed to be negligible at present accuracy. Moreover, 65 nm patterns can be simultaneously delineated by nearand off-axial beams. These results verify the concept of their single-column multibeam formation and indicate that this optics can be applied to lithography for manufacturing on semiconductor devices.

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Preparatory Study for the Matrix-Pattern Imaging, EB System

Cited by 11 publications

References 1 publication

Multibeam scanning electron microscope: Experimental results

Multibeam scanning electron microscope: Experimental results

Parallel electron-beam-induced deposition using a multi-beam scanning electron microscope

Optical properties of a multibeam column with a single-electron source

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