2007
DOI: 10.1016/j.surfcoat.2006.07.211
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Preparation of vanadium oxide thin films with high temperature coefficient of resistance by facing targets d.c. reactive sputtering and annealing process

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Cited by 41 publications
(18 citation statements)
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“…Among these deposition techniques, reactive rf/dc magnetron sputtering is highly preferred for depositing the thin films for the uncooled microbolometer applications because of its merit, such as, high uniformity, highly homogeneous, controllability over the partial pressure of oxygen and ease of operation. Several authors [1,14,15] have investigated the physical properties of sputtered V 2 O 5 thin films deposited at higher sputtering power (above 200 W) or substrate temperature (above 350 1C), which cause complexity in CMOS fabrication of the microbolometer.…”
Section: Introductionmentioning
confidence: 99%
“…Among these deposition techniques, reactive rf/dc magnetron sputtering is highly preferred for depositing the thin films for the uncooled microbolometer applications because of its merit, such as, high uniformity, highly homogeneous, controllability over the partial pressure of oxygen and ease of operation. Several authors [1,14,15] have investigated the physical properties of sputtered V 2 O 5 thin films deposited at higher sputtering power (above 200 W) or substrate temperature (above 350 1C), which cause complexity in CMOS fabrication of the microbolometer.…”
Section: Introductionmentioning
confidence: 99%
“…These oxide layers were deposited by reactive dc sputtering followed by an annealing treatment (673K). The analysis showed a TCR value of ∼−4.4% •K −1 and a sheet resistance of 20 k Ω/square (Dai, X. Wang, He, Huang, & Yi, 2008;Lv et al, 2007). Although these results indicate a breakthrough for material performance, this material is not suitable for micro-machining process on Si and the fabrication of bolometers due to high temperature budget.…”
Section: Vanadium Oxidementioning
confidence: 96%
“…Today, commonly used thermistor materials such as vanadium oxide (VO x ), amorphous, and polycrystalline semiconductors demonstrate moderate noise levels and TCR values around 2%-4% (Lv, Hu, Wu, & Liu, 2007;Moreno, Kosarev, Torres, & Ambrosio, 2007). Recent studies have proposed single crystalline (sc) SiGe as a thermistor material (Di Benedetto, Kolahdouz, Malm, Ostling, & H. H. Radamson, 2009;Vieider et al, 2007;S.…”
Section: Figures Of Merit For Thermistor Materialsmentioning
confidence: 99%
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“…Therefore, both Ptthin-film-based temperature sensors and polymer-film-based temperature sensors can be used in research to optimize and enhance the properties and create flexible and wearable applications. Additionally, temperature sensors using metal alloy (10,11) or ceramic (12)(13)(14) were developed to obtain high TCR. However, those sensors were fabricated on rigid substrates.…”
Section: Introductionmentioning
confidence: 99%