Preparation of uniaxially oriented polyamide films by vacuum deposition polymerization

Sakata, Jiro; Mochizuki, Midori

doi:10.1016/0040-6090(95)08020-1

Cited by 7 publications

(9 citation statements)

References 16 publications

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“…The peak area ratio of the Cl 2p and the O 1s signal shows that the chlorine atoms of all TPC-derived unitspresent either as end groups, amine groups, or the additional, unreactive specieshave been split off and are bonded to the Ag(111) surface. The HCl formation may hence originate from the interior of the whole UHV chamber, either in the monolayer or multilayer regime, from which a formation of HCl as byproduct has been already observed. ,, …”

Section: Resultsmentioning

confidence: 99%

“…The HCl formation may hence originate from the interior of the whole UHV chamber, either in the monolayer or multilayer regime, from which a formation of HCl as byproduct has been already observed. 18,29,33 3.7. Chain Length Distribution.…”

Section: Mechanism Of the Polymerization Reaction On Ag-(111)mentioning

confidence: 99%

“…In a recent study, we have investigated the formation and lateral ordering of the one-dimensional polymer poly( p -phenylene-terephthalamide) (PPTA, trademark: Kevlar and Twaron) based on the monomers p -phenylenediamine (PPD) and terephthaloyl chloride (TPC) on Ag(111) by means of STM . The polymer is prepared by vacuum deposition polymerization (VDP) − of the monomers PPD and TPC in the (sub)monolayer regime. Scheme shows the Lewis formula of the molecules and the principle reaction scheme of the polymerization.…”

Section: Introductionmentioning

confidence: 99%

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Surface Polymerization of Poly(p-phenylene-terephthalamide) on Ag(111) Investigated by X-ray Photoelectron Spectroscopy and Scanning Tunneling Microscopy

et al. 2011

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The formation of poly(p-phenylene-terephthalamide) (PPTA) by surface-assisted polymerization of terephthaloyl chloride (TPC) and p-phenylenediamine (PPD) on Ag-(111) has been studied by X-ray photoelectron spectroscopy (XPS) and scanning tunneling microscopy (STM). Analysis of the XPS data reveals that the polymer is formed in the (sub-) monolayer regime already at room temperature. Upon vacuum deposition of TPC onto the single-crystal surface, the carbonÀ chlorine bond is cleaved, and the polymerization proceeds via a pphenylene dicarbonyl species, which is presumably surface stabilized. This contrasts the reaction mechanism in solution, where the chlorine atom is expelled after a nucleophilic attack by the amine group. Annealing of the sample leads to desorption of residual PPD monomers, lateral ordering of the polymer chains, and further progress of the polymerization that can be followed by XPS. The chain length distribution of the polyamide, as extracted from the XP spectra, is consistent with the typical chain lengths found in STM images.

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Section: Resultsmentioning

confidence: 99%

Section: Mechanism Of the Polymerization Reaction On Ag-(111)mentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Surface Polymerization of Poly(p-phenylene-terephthalamide) on Ag(111) Investigated by X-ray Photoelectron Spectroscopy and Scanning Tunneling Microscopy

et al. 2011

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“…Vapor deposition polymerization (VDP) is a vapor‐based polymerization that typically entails condensation polymerization of two monomers carried out in an ultra high vacuum chamber without the use of a plasma, initiator, or oxidative species, thus differentiating it from PECVD, iCVD, and oCVD 2. The monomers are evaporated from crucibles typically located inside the vacuum chamber and the film deposits on a target substrate which is cooled and located at an optimum distance from the heated crucibles 307–310. The condensation polymerization results in alternating monomer units in the resultant films.…”

Section: Unifying Themesmentioning

confidence: 99%

“…Being a dry process, it offers the same advantages that other vapor‐based deposition processes have over solution and melt processing and can be scaled up and integrated into a microfabrication assembly line. VDP is conducive to tuning film properties such as thickness, conformation, crystallinity and surface orientation 2, 61, 222, 309–317. Films with improved device performance, dielectric properties, stiffness, density and hygroscopic resistance have been deposited by VDP 311, 314, 315.…”

Section: Unifying Themesmentioning

confidence: 99%

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

et al. 2010

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Chemical vapor deposition (CVD) polymerization utilizes the delivery of vapor-phase monomers to form chemically well-defined polymeric films directly on the surface of a substrate. CVD polymers are desirable as conformal surface modification layers exhibiting strong retention of organic functional groups, and, in some cases, are responsive to external stimuli. Traditional wet-chemical chain- and step-growth mechanisms guide the development of new heterogeneous CVD polymerization techniques. Commonality with inorganic CVD methods facilitates the fabrication of hybrid devices. CVD polymers bridge microfabrication technology with chemical, biological, and nanoparticle systems and assembly. Robust interfaces can be achieved through covalent grafting enabling high-resolution (60 nm) patterning, even on flexible substrates. Utilizing only low-energy input to drive selective chemistry, modest vacuum, and room-temperature substrates, CVD polymerization is compatible with thermally sensitive substrates, such as paper, textiles, and plastics. CVD methods are particularly valuable for insoluble and infusible films, including fluoropolymers, electrically conductive polymers, and controllably crosslinked networks and for the potential to reduce environmental, health, and safety impacts associated with solvents. Quantitative models aid the development of large-area and roll-to-roll CVD polymer reactors. Relevant background, fundamental principles, and selected applications are reviewed.

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Overview of Strategies for the CVD of Organic Films and Functional Polymer Layers

Sreenivasan

Gleason

2009

Chemical Vapor Deposition

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Vapor based polymer deposition methods have evolved to address the limitations of solution polymerization. However this field of vapor based polymerization suffers from varied nomenclature and would benefit from a review article that brought together the different approaches to vapor based polymerization with an effort to present existing nomenclature, clearly identify the various approaches within this field and summarize recent results. This review article is written with the purpose of compiling recent advances in vapor based deposition methods of polymers with a focus on applications that will continue to drive research in this field. We hope that this article encourages researchers engineering novel polymer applications to give vapor based polymerization a serious consideration apart from solution polymerization methods.

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Preparation of uniaxially oriented polyamide films by vacuum deposition polymerization

Cited by 7 publications

References 16 publications

Surface Polymerization of Poly(p-phenylene-terephthalamide) on Ag(111) Investigated by X-ray Photoelectron Spectroscopy and Scanning Tunneling Microscopy

Surface Polymerization of Poly(p-phenylene-terephthalamide) on Ag(111) Investigated by X-ray Photoelectron Spectroscopy and Scanning Tunneling Microscopy

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

Overview of Strategies for the CVD of Organic Films and Functional Polymer Layers

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