2009
DOI: 10.1515/htmp.2009.28.1-2.115
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Preparation of TiAl3 Coating on γ-TiAl through Hot-dip Aluminizing and Subsequent Interdiffusion Treatment

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Cited by 7 publications
(5 citation statements)
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“…Other methods of diffusive aluminising of TiAl alloys are also being developed, including out of pack [7] and chemical vapour deposition (CVD) [8]. It is also possible to apply an aluminide coating to the substrate using one of the following methods: cold spray [9], Arc-PVD [10], galvanic [11], slurry [12], hot-dip [13], followed by diffusion annealing. Thermal barrier coatings (TBC) are produced to increase heat resistance on TiAl alloys with, among others, bond coats [14].…”
Section: Introductionmentioning
confidence: 99%
“…Other methods of diffusive aluminising of TiAl alloys are also being developed, including out of pack [7] and chemical vapour deposition (CVD) [8]. It is also possible to apply an aluminide coating to the substrate using one of the following methods: cold spray [9], Arc-PVD [10], galvanic [11], slurry [12], hot-dip [13], followed by diffusion annealing. Thermal barrier coatings (TBC) are produced to increase heat resistance on TiAl alloys with, among others, bond coats [14].…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, the interface between the alloy and the coating is not flat but undulating, and a continuous TiAl3 layer with a mean thickness of 7.3 µm formed at the interface (see Figure 1b). The content of TiAl3 in this Al coating could be controlled by varying the hot-dip aluminizing process [35,36]. Figure 2 shows the schematic illustration of the FSSW-B setup.…”
Section: Introductionmentioning
confidence: 99%
“…[6][7][8][9][10][11][12][13][14][15][16] Aluminising has been used for heat-resistant materials as a coating technique that generates an oxidation-resistant aluminide by reaction diffusion. Studies on aluminising TiAl-based alloys have been conducted using various techniques such as pack cementation, [17][18][19] hot-dip coating, [20][21][22] gas phase aluminising 23 and annealing of electrically plated substrates. 24 The purpose of these aluminising processes is essentially to form an Al-rich intermetallic layer of TiAl 3 , which has a higher oxidation resistance.…”
Section: Introductionmentioning
confidence: 99%