Preparation of N-doped TiO2 photocatalyst by atmospheric pressure plasma process for VOCs decomposition under UV and visible light sources

Chen, Chienchih; Bai, Hsun-Ling; Chang, Sue-min; Chang, Chung‐Liang; Den, Walter

doi:10.1007/s11051-006-9141-2

Cited by 69 publications

(38 citation statements)

References 26 publications

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“…Expanding the range of binding energies of 393-401 eV, two peaks corresponding to the doping species introduction during the nitriding process, this agrees with the comments by other authors [19], [20]. A significant peak is around 396.6 eV, and lower intensity in the 397.5 eV both the TiN [21] are attributed. Two peaks located at 395.2 eV and 396 eV assigned to the NC bonds in the TiN [22], [6], [7].…”

Section: Resultssupporting

confidence: 90%

Sequential Processes to Produce N-TiO₂Films Through Rf Plasmas

et al. 2016

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Abstract. Using as target a CpTi disk in an atmosphere of argon/oxygen and by rf plasma. First titanium dioxide (TiO 2 ) films were obtained on silicon substrates, and subsequently, these films were doped with nitrogen (N-TiO 2 ). In both processes, along four hours at 390°C of temperature. XRay diffraction and Raman spectroscopy confirmed the presence of the nanostructured anatase phase. X-ray photoelectron spectroscopy analyzes indicate that the nitrogen atoms were incorporated into the TiO 2 film with ~33.9 at%. The films reach a thickness of 1.25 ȝm and 40 nm the average uniformity determined by using an atomic force microscope. Finally, UVVis diffuse reflectance spectroscopy outcome evaluated ones an energy band gap reduction from 3.17 eV to 2.95 eV corresponding to TiO 2 films and N-TiO 2 films respectively.

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Section: Resultssupporting

confidence: 90%

Sequential Processes to Produce N-TiO₂Films Through Rf Plasmas

et al. 2016

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“…A significant peak at around 400 eV was recorded (Figure 3). This finding is consistent with that reported previously, where peaks at around 400 eV were assigned to N 1s for doped-TiO 2 powders prepared from TiO 2 and TEATFB and for N-doped anatase TiO 2 made by the atmospheric-pressure plasma-enhanced nanoparticles synthesis (APPENS) process operated under normal temperature [24]. We also measured the 1s XPS spectra of C, B, and F in the prepared codoped-TiO 2 samples, recorded a peak of 285.6 eV for C-Ti, a peak at 191.7 eV for B-Ti, and a peak around 684.5 eV for F-Ti, as well as another peak of 685 eV in the "shoulder" of asymmetrical line for F (standing for F-Ti-O bond).…”

Section: Doped-tio 2 Preparationsupporting

confidence: 93%

“…These data were very close to that shown in [15], where 402 eV was assigned to N-Ti, 191 and 187.5 eV to B-Ti, 285 eV to C-Ti, and 685 eV to F-Ti. Similar results were also published by other laboratories [24][25][26][27][28]. By further measuring the ultraviolet-diffuse reflectance spectra (data not shown), it is easy to calculate the minimum energy required to activate the electron in the doped-TiO 2 samples that fell into the range of 2.98-3.06 eV, which is less than 3.2 eV for TiO 2 .…”

Section: Doped-tio 2 Preparationsupporting

confidence: 84%

Antimicrobial Double-Layer Coating Prepared from Pure or Doped-Titanium Dioxide and Binders

Jin

Liu

et al. 2018

Coatings

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Abstract:Fruit and vegetable containers with microbe-free surfaces can be made by coating with titanium dioxide (TiO 2 ) particles or nonmetal (C, N, B, F) doped-TiO 2 particles, using wear resistant polymers, such as zein, and paint, as the binders and to form a continuous binding phase. The doped-TiO 2 powders absorb visible light radiation, and thus possess a higher antibacterial effect than non-modified TiO 2 particles in environmental conditions. The study also presents a double-layer coating to use less TiO 2 particles in coating, while achieving higher antimicrobial activity. Containers with microbe-free surfaces can stop cross-contamination from infected workers or spoiled/decayed/contaminated fruits or vegetables, and thus are expected to be able to reduce the risk from microbiological contamination of fruits and vegetables during harvest in fields, and postharvest storage or transportation.

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“…Many studies have focused on nitrogen-doped (N-doped) TiO 2 because of its nontoxicity and suitable energy band level for splitting water into H 2 (Sreethawong et al 2009). Recently, new methods for the fabrication of N-doped TiO 2 , such as laser-ablation methods, sol-gel processes, atmospheric pressure plasma processes, ultrasonic-assisted hydrothermal methods, simple impregnation, have been extensively reported (Chen et al 2007;Liu et al 2015;Wanqin et al 2013;Xu et al 2012;Yu and Jimmy 2009;Zhou et al 2014). Among these methods, wet chemical processes, such as the solgel process, are widely applied because of their simple equipment requirements, low cost, and easy structural modification (Bischoff and Anderson 1995;Yasumori et al 2001).…”

Section: Introductionmentioning

confidence: 99%

Characterization and photoactivity of Pt/N-doped TiO2 synthesized through a sol–gel process at room temperature

Huang

Tseng

et al. 2015

J Nanopart Res

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The rates of photocatalytic production of H 2 by Pt/N-doped TiO 2 are significantly affected by the hydrolysis temperature applied during the sol-gel process. Production rates increase as the hydrolysis temperature decreases from 40 to 20°C. The effects of the hydrolysis temperature on the properties and water-splitting behavior of photocatalysts were investigated. Characterization results showed that hydrolysis temperatures higher than 40°C induce the formation of the rutile phase and particle agglomeration, reduce the N-dopant content, and decrease the range of visible-light absorption. In this study, a low hydrolysis temperature of about 20°C is optimal for the sol-gel preparation of N-doped TiO 2 ; this temperature favors the formation of high-purity anatase, small particle size, extensive visible-light absorption, and excellent rates of photocatalytic production of H 2 (about 2100 lmol h -1 g -1 ).

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Preparation of N-doped TiO2 photocatalyst by atmospheric pressure plasma process for VOCs decomposition under UV and visible light sources

Cited by 69 publications

References 26 publications

Sequential Processes to Produce N-TiO₂Films Through Rf Plasmas

Sequential Processes to Produce N-TiO₂Films Through Rf Plasmas

Antimicrobial Double-Layer Coating Prepared from Pure or Doped-Titanium Dioxide and Binders

Characterization and photoactivity of Pt/N-doped TiO2 synthesized through a sol–gel process at room temperature

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Preparation of N-doped TiO2 photocatalyst by atmospheric pressure plasma process for VOCs decomposition under UV and visible light sources

Cited by 69 publications

References 26 publications

Sequential Processes to Produce N-TiO2Films Through Rf Plasmas

Sequential Processes to Produce N-TiO2Films Through Rf Plasmas

Antimicrobial Double-Layer Coating Prepared from Pure or Doped-Titanium Dioxide and Binders

Characterization and photoactivity of Pt/N-doped TiO2 synthesized through a sol–gel process at room temperature

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Product

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Sequential Processes to Produce N-TiO₂Films Through Rf Plasmas

Sequential Processes to Produce N-TiO₂Films Through Rf Plasmas