Preparation of metallic organotin films by glow discharge polymerization and their properties

Sadhir, R. K.; James, William Joseph; Auerbach, Robert A.

doi:10.1016/0040-6090(82)90413-8

Cited by 45 publications

(8 citation statements)

References 11 publications

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“…13 Ultrathin pinhole-free films of this sort can be obtained on a variety of substrates and with superior adhesion. 14 Such an extensively cross-linked film possesses excellent barrier and mechanical properties [15][16][17] and other useful characteristics that find wide application throughout various industries. 12,18 -21 Plasma techniques have long been used for thin film deposition on flat substrates.…”

Section: Introductionmentioning

confidence: 99%

Deposition kinetics on particles in a dusty plasma reactor

Cao

Matsoukas

2002

Journal of Applied Physics

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We report on the use of dusty plasma chemical vapor deposition for the coating of micron and submicron sized particles. Particles are introduced into a capacitively coupled low-pressure plasma where they become charged and remain electrostatically confined over extended periods of time. Introduction of a hydrocarbon in the plasma results in the formation of a cross-linked solid ͑plasma polymer͒ which deposits on the particle surface in the form of a film. The thickness of the coating varies from 3 nm to more than several hundred nanometers and is found to be a linear function of time. The size distribution and the uniformity of deposition are studied as a function of the deposition time and particle size and the results are interpreted qualitatively via a surface deposition model.

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Section: Introductionmentioning

confidence: 99%

Deposition kinetics on particles in a dusty plasma reactor

Cao

Matsoukas

2002

Journal of Applied Physics

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“…Similar formation of carbon-rich polymers by plasma polymerization of TMT has been reported by Kny et al, They showed that the C/Sn atomic ratio varied from 2.2 to 31. 4 and that the variation depended on the relative position between the rf energy input zone and the polymer deposition zone. The pyrolysis at 350-500°C in air made the plasma polymers from transparent to brown, and also made the polymer poor in carbon and oxygen contents (Table I), especially the C/Sn atomic ratio decreased from 12.1 and 1.0 by pyrolysis at 350 and 450°C, respectively.…”

Section: Chemical Composition Of Plasma Polymers Prepared From Tmtmentioning

confidence: 97%

CO gas sensor devices plasma‐polymerized from tetramethyltin

Inagaki¹,

Tasaka²,

Mase³

1989

J of Applied Polymer Sci

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SynopsisThin films plasma-polymerized from tetramethyltin was applied for CO gas sensor device. The films formed from tetramethyltin contains alkyl chains with organic tin moieties, and pyrolysis of them at 350-500°C yields carbonized films with SnO, moieties. The electrical resistance for the films pyrolized at 350-500°C decreases in exposing to CO gas. The sensitivity, the ratio of the electrical resistance between in air and in CO atmasphere, is enhanced by catalytic actions of palladium chloride, specially in operation at low temperatures below 50°C. The gas sensitivity between CO and other gases such as ethanol, methane, and propane gases is good. The possible determination of CO gas concentration by the sensor device is in ranges from 10 to loo0 ppm. INTRODUCTIONSnO, is an n-type semiconductor. The SnO, surface is of interest in electrochemical behavior. When the SnO, surface is exposed to reducible gases, the oxidation of them occurs at the SnO, surface, and, consequently, the electrical resistance of the SnO, surface decreases. This is a basic mechanism to detect propane gas with a gas sensor device.' Essentially, the detection of gases from decrease in electrical resistance of the SnO, surface is not restricted to propane gas, but is extend to other reducible gases. CO gas, which is a hazardous material because of rapid reactions with hemoglobin of human blood, is one of reducible gases.Plasma polymerization is a polymer-forming process and has many characteristics including: (1) Volatile-organic molecules, even if they have no functional groups to be polymerized, are plasma-polymerized easily in the discharge state and (2) thin films deposit directly on the substrate surface without fabrication. Therefore, we are able to obtain films with many metals using plasma polymerization technique. The preparation and physical properties of plasma polymers containing metals were reported. They involve germanium,6 copper? Tin-containing polymers are obtained easily from plasma polymerization of tetramethyltin and show semiconductive ~roperties.~ This study is a preliminary application of plasma films prepared from tetramethyltin to CO gas sensor device. EXPERIMENTAL Plasma PolymerizationThe apparatus for plasma polymerization and the experimental procedures are similar to those reported elsewhere! The reaction chamber (100 mm i.d., 2342 INAGAKI, TASAKA, AND MASE 400 mm long) made of Pyrex glass is equipped with a monomer inlet, a pressure gauge, a vacuum system, and a matching network for the inductive coupling of a 13.56 MHz radio frequency (rf) source. Prior to performing plasma polymerization surfaces of the substrates on which plasma polymers would deposit were exposed to argon plasma for 10 min to eliminate water adsorbed on them. Afterwards plasma polymerization was performed under discharge conditions of an rf power of 25 W, a monomer flow rate of 1.87 cm3 (STP)/min, and a Tressure in the reaction chamber of 1.3 Pa. This operating condition of the plasma polymerization corresponds to a W / F M value of 100 ...

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“…Plasma polymers are typical insulators with the electrical conductivity ofthe order of iO' S/rn {lJ. Using different techniques and parameters of the polymerisation process one can increase the conductivity up to the values typical for semiconductors (-lO4S/m) [2].…”

Section: Introductionmentioning

confidence: 99%

<title>Electrical properties of some plasma polymers obtained by remote microwave plasma chemical vapor deposition</title>

Włodarska

Staryga

Walkiewicz-Pietrzykowska

et al. 1999

SPIE Proceedings

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Some electrical properties of amorphous hydrogenated silicon-carbon (a-Si:C:H) films produced by remote microwave hydrogen plasma chemical vapour deposition (RHP-CVD) technique are discussed. The DC conduction of Al/aSi:C:H/Au and AlIa-Si:C:FJJn-Si structures has been measured. Dielectric response ofthese structures has also been examined. The films are weakly conducting materials with the activation energy of the conductivity equal to 0.28 eV and 0.03 eV. MIS structures containing the amorphous silicon-carbon films as an insulator show the influence of trapping phenomena at the insulator-silicon interface.

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Preparation of metallic organotin films by glow discharge polymerization and their properties

Cited by 45 publications

References 11 publications

Deposition kinetics on particles in a dusty plasma reactor

Deposition kinetics on particles in a dusty plasma reactor

CO gas sensor devices plasma‐polymerized from tetramethyltin

<title>Electrical properties of some plasma polymers obtained by remote microwave plasma chemical vapor deposition</title>

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