Preparation of metal (W, Mo, Nb, Ti) containing a-C:H films by reactive magnetron sputtering

Corbella, Carles; Vives, M.; Pinyol, A.; Bertrán, E.; Canal, Cristina; Polo, M.C.; Andújar, J.L.

doi:10.1016/j.surfcoat.2003.09.017

Cited by 69 publications

(30 citation statements)

References 23 publications

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“…For argon ions at an energy of 1 keV, the yield is 3.8 for copper but only 0.9 for titanium, according to SRIM [25] simulations. No metal was found in the surface of different metal DLC films when the relative amount of methane in the process gas constituted 25% or more [24]. Here, a similar observation can be made.…”

Section: Preparation Process and Metal Contentsupporting

confidence: 81%

“…Particle radii increase monotonically with increasing metal content and so do the particle distances [31]. For Nb-DLC and Mo-DLC a crystallite size of 4-6 nm was reported [24]. For Ti-DLC films crystallites of TiC of a similar size (about 10 nm) were found for an amount of 30% of Ti within the films [32].…”

Section: Structure Of Me-dlc Filmsmentioning

confidence: 91%

“…Starting with a flow rate of zero for the hydrocarbon, there is obviously only the deposition of metal onto the substrate. Increasing the relative flow of the hydrocarbon to a few percent, there is a sharp decrease in metal content [24]. Because the hydrocarbon in front of the sputter source is ionized in the same way as the argon is, it is also accelerated onto the sputter target.…”

Section: Preparation Process and Metal Contentmentioning

confidence: 99%

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Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties

Flege

Hatada

Hanauer

et al. 2017

Advances in Materials Science and Engineering

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Metal-containing diamond-like carbon (Me-DLC) films were prepared by a combination of plasma source ion implantation (PSII) and reactive magnetron sputtering. Two metals were used that differ in their tendency to form carbide and possess a different sputter yield, that is, Cu with a relatively high sputter yield and Ti with a comparatively low one. The DLC film preparation was based on the hydrocarbon gas ethylene (C 2 H 4 ). The preparation technique is described and the parameters influencing the metal content within the film are discussed. Film properties that are changed by the metal addition, such as structure, electrical resistivity, and friction coefficient, were evaluated and compared with those of pure DLC films as well as with literature values for Me-DLC films prepared with a different hydrocarbon gas or containing other metals.

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Section: Preparation Process and Metal Contentsupporting

confidence: 81%

Section: Structure Of Me-dlc Filmsmentioning

confidence: 91%

Section: Preparation Process and Metal Contentmentioning

confidence: 99%

See 1 more Smart Citation

Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties

Flege

Hatada

Hanauer

et al. 2017

Advances in Materials Science and Engineering

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“…A similarly strong increase in the deposition rate with increasing ethine flow rate, whilst other parameters are kept constant, is also reported in [11] and [15]. As already mentioned in Section 1, the reason is that, with the increasing availability of the precursor, the reactive component of the film deposition process is enhanced, resulting in an increased carbon content of a-C:H:W [10,12,37] and a decreased film density [12].…”

Section: Bias Currentsupporting

confidence: 72%

Empirical-Statistical Study on the Relationship between Deposition Parameters, Process Variables, Deposition Rate and Mechanical Properties of a-C:H:W Coatings

et al. 2014

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Tungsten-modified hydrogenated amorphous carbon coatings (a-C:H:W) were deposited on high speed steel by reactive magnetron sputtering of a tungsten carbide target in an argon-ethine atmosphere. The deposition parameters, sputtering power, bias voltage, argon and ethine flow rate, were varied according to a central composite design comprising 25 different parameter combinations. For comparison, a tungsten carbide coating was deposited, as well. During coating deposition, the process variables, total pressure, sputtering voltage and bias current, were measured as process characteristics. The thickness of the deposited coatings was determined using the crater grinding method, and the deposition rate was calculated. Young's modulus E and indentation hardness H IT were characterized by means of nanoindentation. With E = 80 − 253 GPa and H IT = 7.8 − 22.0 GPa, the mechanical properties were found to vary strongly in between different a-C:H:W variants. Using statistical methods, it is shown that these properties, as well as the deposition rate significantly depend on all four varied parameters. Despite a very similar influence of the parameters on modulus and hardness, as well as a very strong correlation of both properties, it is pointed out statistically that the H/E ratio, which is an indicator of the wear resistance, can be adapted in a targeted way and with some degree of independence.

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“…Incorporation of transition metals which form carbides, such as Ti, Mo, Cr, or W, in a-C films has been one of the most common strategies to reduce the residual stress of a-C films. [1][2][3][4][5] However, the mechanism of the reduction in residual stress by the metal incorporation is not yet fully understood. One of the difficulties is that the atomic bonding within the amorphous carbon matrix varies with metal incorporation.…”

Section: Introductionmentioning

confidence: 99%

Stress reduction behavior in metal-incorporated amorphous carbon films: first-principles approach

Choi

Ahn

Lee

et al. 2006

J. Phys.: Conf. Ser.

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Stress reduction behavior in metal-incorporated amorphous carbon films: first-principles approach Abstract. The stress reduction behavior in metal-incorporated amorphous carbon films was investigated by the first-principle calculation. We calculated the total energy of the system with changes in bond angles between the incorporated metal (Ti, Mo, Cr, W, Ag, Au, Al, Si, etc) and the carbon atoms by using DMOL 3 computational software package. The four carbon atoms are arranged as a tetrahedron, with a carbon or metal atom at the center. The total energy increased substantially as the bond angle deviated from the equilibrium value when a carbon atom is located at the tetrahedron center. However, with a replacement by a metal atom at the center of the tetrahedron, the increase in the total energy due to the distortion in bond angle was significantly reduced. The pivotal action of the metal atoms dissolved in the carbon matrix would be more significant when noble metals having filled d-shells are incorporated compared to the transition metals having unfilled d-shells. These atoms have a weak and more isotropic bond with carbon atoms as confirmed by the electron density distribution.

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Preparation of metal (W, Mo, Nb, Ti) containing a-C:H films by reactive magnetron sputtering

Cited by 69 publications

References 23 publications

Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties

Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties

Empirical-Statistical Study on the Relationship between Deposition Parameters, Process Variables, Deposition Rate and Mechanical Properties of a-C:H:W Coatings

Stress reduction behavior in metal-incorporated amorphous carbon films: first-principles approach

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