2017
DOI: 10.1016/j.apsusc.2016.11.153
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Preparation of high-quality graphene via electrochemical exfoliation & spark plasma sintering and its applications

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Cited by 43 publications
(13 citation statements)
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“…However, the rGO sheets were restacked together after the high‐temperature annealing. Alternatively, Gong et al used spark plasma sintering at 1500°C to treat electrochemically exfoliated GO. Oxygen functional groups were eliminated, resulting in graphene materials with low defect density ( I D / I G ration of 0.16) and high C/O ratio of 25.3.…”
Section: Graphene Synthesis By Electrochemical Exfoliationmentioning
confidence: 99%
“…However, the rGO sheets were restacked together after the high‐temperature annealing. Alternatively, Gong et al used spark plasma sintering at 1500°C to treat electrochemically exfoliated GO. Oxygen functional groups were eliminated, resulting in graphene materials with low defect density ( I D / I G ration of 0.16) and high C/O ratio of 25.3.…”
Section: Graphene Synthesis By Electrochemical Exfoliationmentioning
confidence: 99%
“…[141] Recently, Pan et al suggested that applying a low voltage of < 10 V when adding KOH made the process too slow and inefficient. [142] Therefore, they proposed a method, which combined electrochemical exfoliation with the newly discovered spark plasma sintering. Moreover, surfactants have been added in the electrochemical exfoliation process to avoid aggregation.…”
Section: Electrochemical Exfoliationmentioning
confidence: 99%
“…Different CNMs were consolidated by SPS [ 26 , 27 , 28 ]. Consolidated CNMs can be used as adsorbents [ 29 ], biocompatible materials [ 30 ], catalysts, catalysts supports [ 31 ] and electrodes in energy storage devices [ 32 ].…”
Section: Introductionmentioning
confidence: 99%