Preparation of graded-index thin films with specific index profile by metal-organic chemical vapour deposition

CVD‐Fabricated Aluminum Oxide Coatings from Aluminum tri‐iso‐propoxide: Correlation Between Processing Conditions and Composition

“…Films of Al 2 O 3 were claimed to be deposited at 693, [2] 673-773, [18][19][20] 673, [21] 623-773, [22] 623-673, [23] below 603, [24] 573, [25] 523-693, [26,27] and 523-673 K. [28] Low-temperature deposition (598-773 K) from ATI was also used for preparing gradedindex aluminum oxide thin films. [29,30] Corrosion resistance studies were performed on films grown at 623 [31] or 693 K. [32] Most of these works were more pragmatic approaches to ameliorate film properties (generally the electrical behavior) than systematic investigations on the correlation between experimental parameters and film composition and properties. Compositional uncertainties are frequently reported for the films prepared at the lowest temperatures.…”

Low Temperature MOCVD-Processed Alumina Coatings

“…Films of Al 2 O 3 were claimed to be deposited at 420°C [2], 400-500°C [28][29][30], 400°C [31], 350-500°C [32], 350-400°C [33], below 330°C [34], 300°C [35], 250-420°C [36], 250-400°C [37]. Low-temperature deposition (325-500°C) from ATI was also used for preparing graded-index aluminium oxide thin films [38,39].…”

“…Yom et al [51] obtained well crystallized heteroepitaxial films of γ-Al 2 O 3 on Si(100) substrates at 740°C and 3 torr (400 Pa), using a vertical reactor, Ar as a carrier gas and N 2 O as a reactive gas. Dhanavantri and Karekar [38,39] have prepared graded-index thin films by varying the substrate temperature between 300°C (n = 1.562) and 450°C (n = 1.622).…”

“…Following Aboaf's pioneering works [2], most of the MOCVD preparations of alumina thin films mention aluminium alkoxides as sources. ATI has been the most used one [2,7,[28][29][30][31][32][33][34][35][36][37][38][39][40][41][42][43][44][45][46][48][49][50][51][52] as it is easy to use and despite problems due to ageing.…”

Protective Alumina Coatings by Low Temperature Metalorganic Chemical Vapour Deposition

“…Films of Al 2 O 3 were claimed to be deposited at 693K [2], 673K-773K [3][4][5], 673K [6], 623K-773K [7], 623K-673K [8], below 603K [9], 573K [10], 523K-693K [11,12], 523K-673K [13]. Low-temperature deposition (598K-773K) from ATI was also used for preparing gradedindex aluminium oxide thin films [14,15]. Corrosion resistance studies were performed on films grown at 623 K [16] or 693 K [17].…”