2013
DOI: 10.1016/j.tsf.2013.02.051
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Preparation of Cu2ZnSnS4 thin films via electrochemical deposition and rapid thermal annealing

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Cited by 45 publications
(32 citation statements)
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“…[7,16] The electrochemical deposition was performed using a conventional three-electrode system with a Mo-coated soda-lime glass substrate (3 4 cm 2 , working), a Pt plate (counter), and a saturated Ag/AgCl reference electrode. [7,16] The electrochemical deposition was performed using a conventional three-electrode system with a Mo-coated soda-lime glass substrate (3 4 cm 2 , working), a Pt plate (counter), and a saturated Ag/AgCl reference electrode.…”
Section: Sample Preparationmentioning
confidence: 99%
See 1 more Smart Citation
“…[7,16] The electrochemical deposition was performed using a conventional three-electrode system with a Mo-coated soda-lime glass substrate (3 4 cm 2 , working), a Pt plate (counter), and a saturated Ag/AgCl reference electrode. [7,16] The electrochemical deposition was performed using a conventional three-electrode system with a Mo-coated soda-lime glass substrate (3 4 cm 2 , working), a Pt plate (counter), and a saturated Ag/AgCl reference electrode.…”
Section: Sample Preparationmentioning
confidence: 99%
“…[1] A variety of synthetic processes, including thermal co-evaporation, [2] sputtering, [3] pulsed laser deposition, [4] solution processes, [5] and electrochemical deposition, [6,7] have been applied in the preparation of CZTSSe thin films. This is mainly due to the high energy production costs.…”
mentioning
confidence: 99%
“…The mole ratios of the materials were 0.02 M CuSO 4 Á 5H 2 O, 0.035 M ZnSO 4 Á 7H 2 O, and 0.014 M SnCl 2 with 0.5 M Tri-sodium citrate as a mixing agent [18]. The raw materials were deposited at a constant current density of 1.3 mA/cm 2 for 2000 s, and the three electrode systems used for the electrochemical deposition included a Mo-coated soda-lime glass substrate (working), a Pt plate (counter), and a saturated Ag/AgCl reference electrode.…”
Section: Methodsmentioning
confidence: 99%
“…The raw materials were deposited at a constant current density of 1.3 mA/cm 2 for 2000 s, and the three electrode systems used for the electrochemical deposition included a Mo-coated soda-lime glass substrate (working), a Pt plate (counter), and a saturated Ag/AgCl reference electrode. The metallic precursor films were annealed in a quartz tube furnace under a sulfur atmosphere (vaporized elemental sulfur with high-purity Ar carrier gas) [18], and the films were sulfurized at various temperatures at around 550°C. KCN etching was performed with a 10% KCN solution with distilled water for 3 min.…”
Section: Methodsmentioning
confidence: 99%
“…CZTS absorber layer have been deposited by using various processes [4][5][6][7][8][9][10]. Recently, electrodeposition was proposed and studied for a large-area and low-cost film deposition method [11][12][13][14][15]. In this method, CZTS absorber layer is grown by sulfurizing after preheating the electrodeposited Cu/Sn/Zn metallic precursor layer.…”
mentioning
confidence: 99%