Preparation of Cr(N,O) thin films by RF reactive unbalanced magnetron sputtering

Shirahata, Jun; Ohori, Tetsutaro; Asami, Hiroki; Suzuki, Tsuneo; Nakayama, Tadachika; Suematsu, Hisayuki; Nakajima, Yoshiki; Niihara, Koichi

doi:10.1016/j.tsf.2011.01.106

Cited by 13 publications

(5 citation statements)

References 8 publications

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“…7c which revealed a spotty ring pattern, indicating a nanocrystalline nature and absence of texture. The d values calculated from the SAED diffraction spots are matched with (1 1 1), (2 0 0), (2 2 0) and (2 2 2) planes of CrN [42]. No diffraction rings of Al 2 O 3 were observed, indicating its amorphous nature.…”

Section: Tem Studymentioning

confidence: 57%

Effects of antireflection layers on the optical and thermal stability properties of a spectrally selective CrAlN–CrAlON based tandem absorber

Zou

Huang

Wang

et al. 2015

Solar Energy Materials and Solar Cells

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Section: Tem Studymentioning

confidence: 57%

Effects of antireflection layers on the optical and thermal stability properties of a spectrally selective CrAlN–CrAlON based tandem absorber

Zou

Huang

Wang

et al. 2015

Solar Energy Materials and Solar Cells

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“…Previously, CrN and Cr(N,O) thin films were synthesized by PLD 21,22) or RF reactive unbalanced magnetron sputtering [23][24][25] as hard coatings for cutting tools. Moreover, we have proposed the dissolution of third elements at the Cr sites of CrN and Cr(N,O) in order to improve the hardness of these films 26) and synthesized (Cr,Al)N, 27) Cr-Al-N-O, 28) (Cr,Mg)(N,O), 29) Cr-Zn-N-O, 30) and Cr-Si-N 31) thin films by PLD.…”

Section: Experimental Methodsmentioning

confidence: 99%

Changes in the electric resistivity of CrN subsequent to oxygen dissolution

Nagasawa

Suzuki

Sato

et al. 2016

Jpn. J. Appl. Phys.

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Single-phase epitaxial chromium oxynitride thin films containing 11 to 45 mol % oxygen were successfully synthesized on MgO(100) substrates by pulsed laser deposition at 773 K while controlling the ambient oxygen partial pressure. The film compositions were subsequently analyzed by Rutherford backscattering spectroscopy and electron energy-loss spectroscopy, while crystal phases were identified by X-ray diffractometry using the Bragg–Brentano and glancing incidence configurations and by in-plane φ scanning. The microstructures were observed by transmission electron microscopy. The electrical resistance of the films was determined by either the two- or four-probe method. The Cr(N,O) thin film having 11 mol % oxygen exhibited a metallic temperature dependence. In contrast, the films containing oxygen of 13 mol % or higher showed a semiconducting (or insulating) temperature dependence. This resistivity change is believed to result from enhanced electron correlation brought about by increases in oxygen content, sufficient to transform the Cr(N,O) thin film into a Mott insulator.

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“…Details of the coating apparatus were reported in our previous report. 5) The composition of the thin films was determined by Rutherford backscattering spectroscopy (RBS; NHV NT-1700HS) using 2 MeV He þ ions; the specimens used were approximately 200-nm-thick films deposited on glassy carbon substrates. In this study, only deposition time was decreased to obtain shaped narrow steps in the RBS spectrum for better quantification accuracy.…”

Section: Methodsmentioning

confidence: 99%

Fourier-Transform Infrared Absorption Spectroscopy of Chromium Nitride Thin Film

Shirahata¹,

Ohori²,

Asami

et al. 2011

Jpn. J. Appl. Phys.

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Low-frequency noise (1/f noise) has been measured in light emitting diodes (LEDs) which have been subjected to an accelerated life test by means of large forward bias current pulses. Over a large range of stress pulses the electrical and functional LED properties remain unaltered but an increase in the 1/f noise level was seen and this was correlated with the device reliability. The product 'initial noise × initial rate of noise increase' correlated best with the LED lifetime.

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Preparation of Cr(N,O) thin films by RF reactive unbalanced magnetron sputtering

Cited by 13 publications

References 8 publications

Effects of antireflection layers on the optical and thermal stability properties of a spectrally selective CrAlN–CrAlON based tandem absorber

Effects of antireflection layers on the optical and thermal stability properties of a spectrally selective CrAlN–CrAlON based tandem absorber

Changes in the electric resistivity of CrN subsequent to oxygen dissolution

Fourier-Transform Infrared Absorption Spectroscopy of Chromium Nitride Thin Film

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