“…The latest advances in this area suggest that the effect of stress and lateral defects in CdTe-based epitaxial heterostructures on generation recombination mechanisms could be greatly eliminated by proper growth and thermal annealing [13][14][15][16][17]. Various techniques have been used to achieve this goal in the growth processes of the CdTe layers, namely, molecular beam epitaxy (MBE), metalorganic chemical vapor deposition, hot wall epitaxy, pulsed laser deposition, and electro deposition [18][19][20][21][22]. The growth by vapor phase epitaxy (VPE) has also been considered because of the lower cost, high growth rate, and the capability of producing large area films [3].…”