Preparation of Boron Carbide from BF3 and BCl3 in Hydrogen Plasma of Arc RF Discharge

Peculiarities of the formation of a filamentary structure of a microwave discharge in an argon flow

“…By all appearances, such nonequilibrium mechanism of gas excitation in the region of nonselfsustained discharge allows a significantly nonequilibrium distribution of temperature characteristics to be realized in the plasma halo, that were measured in previous works [26,27]. This type of nonequilibrium continuous discharge of atmospheric pressure can be used to solve a number of problems of the modern industrial plasmachemistry [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. The efficiency of its use to destruct molecular compounds with high bonding energy is demonstrated by means of an example of the carbon dioxide utilization task [10].…”

“…Studying of nonequilibrium high pressure microwave discharges is an important applied task. The relevance of research activities in this field of the plasma physics is attributable first of all to potential industrial applications in the problems of nonequilibrium plasma chemistry [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. Microwave discharges have highly localized energy in the region of support, limited by the geometry of microwave beam or a waveguiding structure with a characteristic spatial scale of an order of wavelength of the heating field.…”

Application of RF (13.56 MHz) Arc Discharge for Plasma Chemical Conversion of Volatile Chlorides of Silicon and Germanium.

“…Experiments on the investigation of the reduction processes of silicon and germanium tetrachlorides in hydrogen plasma were carried out on installation which schematic diagram was described in detail in [7,8]. The power of high-frequency oscillator was 340 W, the frequency was 40.68 MHz.…”

Theoretical study of dissociative recombination and vibrational excitation of the ${\mathrm{BF}}_{2}^{+}$ ion by an electron impact

“…Non-equilibrium plasmas produced by electrical discharges in BF 3 -containing feed gas are of continually increasing interest for a large number of applications. In particular, BF 3 is very often the boron carrier when plasmas are used for material processing [1][2][3]. Basically, BF 3 plasmas are used either for (i) the synthesis of ultra-hard boron compounds, e.g.…”

“…Basically, BF 3 plasmas are used either for (i) the synthesis of ultra-hard boron compounds, e.g. boron carbides [1], (ii) the deposition of boron nitride, an advanced material with a large number of functionalities [2], and (iii) p-type doping by boron in the semi-conductor and photovoltaic industries [3,4]. As far as doping applications are concerned, plasma immersion ion implantation (PIII) processes are probably one of the most promising in terms of cost and technical performance [4,5].…”