Preparation of Al-doped ZnO thin films by RF thermal plasma evaporation

Synthesis and Characterization of ZnO Nanopowders and ZnO-CNT Nanocomposites Prepared by Chemical Precipitation Route

“…The synthesis of nanoparticles has become a highly developed eld owing to the scientic and technological interest due to the structural peculiarities and unusual physical and chemical properties they may lead to [4]. In recent years, it has been found that ZnO can be synthesized by various routes such as electron beam evaporation technique [5], chemical spray pyrolysis technique [1], RF thermal plasma evaporation [6], solgel method [3,7], and precipitation [1,7] methods. Among these methods, precipitation has many advantages over the other methods, for example, it is unsophisticated and a low cost method.…”

Comparison of Electrical, Optical, and Structural Properties of RF-Sputtered ZnO Thin Films Deposited Under Different Gas Ambients

“…Electrical and optical properties of Al doped ZnO films prepared under Ar and Ar þ O 2 ambient have been studied by Kluth et al 6) and Jin et al 7) for solar cell application. Using RF thermal plasma evaporation technique Tsujino et al 8) prepared ZnO:Al films and studied the effect of O 2 on their properties. Luminescent properties of ZnO thin films including violet, blue, and green-yellow emissions have been studied by many other groups [9][10][11][12] however, the exact origin of such emission is still in dispute.…”

Photoluminescence of chemical bath deposited ZnO:Al films treated by rapid thermal annealing

“…The properties of such films prove to be strongly dependent on the fabrication method, co-doping species and conditions of postgrowth treatment. A wide variety of synthetic methods has been used to fabricate high quality ZnO:Al thin films, some of which are radiofrequency thermal plasma evaporation [5], pulsed laser deposition [6], chemical vapor deposition [7], metalorganic chemical vapor deposition and sputtering [8]. Over the past years, the method of chemical bath deposition became widely used for the fabrication of ZnO:Al thin films due to its simplicity of preparation, satisfactory stability, low cost equipment and low deposition temperatures.…”