Preparation methods and characteristics of fluorinated polymers for mold replication

Tsunozaki, Kentaro; Kawaguchi, Yasuhide

doi:10.1016/j.mee.2008.11.002

Cited by 13 publications

(5 citation statements)

References 7 publications

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“…Therefore, many studies of the resins with fluorosurfactants have been reported. [28][29][30][31] In addition, a thin residual layer is desired when we fabricate an ultra fine pattern by NIL. The aspect ratio of ultra fine pattern is generally 1 : 1.…”

Section: Introductionmentioning

confidence: 99%

Evaluation of fluorosurfactant distribution in ultrathin UV nanoimprint resin by X-ray photoelectron spectroscopy

Oyama

Okada

Iyoshi

et al. 2014

Jpn. J. Appl. Phys.

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The mold-and antisticking-layer-lifetime improvement is required in nanoimprint lithography. One of the effective methods for such improvement is the use of a resin with release properties. To induce the release properties, fluorosurfactants are added to a nanoimprint resin. The compatibility of fluorosurfactants with resins is an important factor because it affects the segregation of fluorosurfactants. We added two types of fluorosurfactants to an ultrathin UV nanoimprint resin of about 20 nm thickness; one is compatible, and the other is non compatible with the resin. Then, we evaluated the fluorosurfactant depth distribution in an ultrathin resin film by X-ray photoelectron spectroscopy. Contrary to our expectation, both types of fluorosurfactants were segregated on the resin surface. Furthermore, it was confirmed by atomic force microscopy that the non compatible fluorosurfactant agglutinates on the resin surface containing a high additive amount was contained in the resin.

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Section: Introductionmentioning

confidence: 99%

Evaluation of fluorosurfactant distribution in ultrathin UV nanoimprint resin by X-ray photoelectron spectroscopy

Oyama

Okada

Iyoshi

et al. 2014

Jpn. J. Appl. Phys.

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“…Despite the extensive utilization of working stamps [2][3][4][5][6] in mass fabrication defect formation on master stamps is inevitable. Thus, NIL stamps have a limited life-expectation.…”

Section: Introductionmentioning

confidence: 99%

Focused ion beam induced Ga-contamination—An obstacle for UV-nanoimprint stamp repair?

Waid

Wanzenboeck

Gavagnin

et al. 2013

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Integration of moth-eye structures into a poly(dimethylsiloxane) stamp for the replication of functionalized microlenses using UV-nanoimprint lithography Ultravoilet (UV)-nanoimprint lithography (NIL) master stamps are subject to wear due to the mechanical nature of the imprint process. To extend the useful lifespan of expensive NIL master stamps, a focused ion beam repair process is highly desirable. Due to the inevitable Ga-staining induced by the focused ion beam processing the transmissivity of repaired NIL stamps is locally degraded. In this work, the authors investigate the impact of Ga-induced transmission losses on the imprint process. Experimental results indicate that the reduced transparency mainly impacts the amplitude of bow deformations in the imprint. These deformations are strongly enhanced by Ga-staining of the master stamp. The authors present a method for quantification of such bow-deformations. The introduced bowing-factor allows to make a qualified decision on whether the occurring deformation is acceptable for the target application. The authors have achieved control over the extent of the Ga-induced bow-deformation by tuning the UV-dose applied during NIL resist exposure. The bowing-factor provides excellent guidance for adapting the required exposure-dose of the NIL resist to reduce the bow-deformation to an acceptable level. With the presented approach, the mitigation of Ga-staining induced defects in the imprint is successfully achieved.

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“…ASL has an important role when separating mold from resin, but this layer degrades with repeated imprint operations [6,7]. To prevent the degradation of the ASL, nanoimprint resins with release property are required [8][9][10]. So far, we reported the evaluation of the cationic polymerization type of UV-curable resin added with the fluorine additive [11].…”

Section: Introductionmentioning

confidence: 99%

Surface Evaluation of Cationic UV-curable Resin with Fluorine Additive by X-ray Photoelectron Spectroscopy

Oyama

Okada

Iyoshi

et al. 2013

J. Photopol. Sci. Technol.

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Preparation methods and characteristics of fluorinated polymers for mold replication

Cited by 13 publications

References 7 publications

Evaluation of fluorosurfactant distribution in ultrathin UV nanoimprint resin by X-ray photoelectron spectroscopy

Evaluation of fluorosurfactant distribution in ultrathin UV nanoimprint resin by X-ray photoelectron spectroscopy

Focused ion beam induced Ga-contamination—An obstacle for UV-nanoimprint stamp repair?

Surface Evaluation of Cationic UV-curable Resin with Fluorine Additive by X-ray Photoelectron Spectroscopy

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