Evaluation of fluorosurfactant distribution in ultrathin UV nanoimprint resin by X-ray photoelectron spectroscopy

Abstract

The mold-and antisticking-layer-lifetime improvement is required in nanoimprint lithography. One of the effective methods for such improvement is the use of a resin with release properties. To induce the release properties, fluorosurfactants are added to a nanoimprint resin. The compatibility of fluorosurfactants with resins is an important factor because it affects the segregation of fluorosurfactants. We added two types of fluorosurfactants to an ultrathin UV nanoimprint resin of about 20 nm thickness; one is compatible, and the other is non compatible with the resin. Then, we evaluated the fluorosurfactant depth distribution in an ultrathin resin film by X-ray photoelectron spectroscopy. Contrary to our expectation, both types of fluorosurfactants were segregated on the resin surface. Furthermore, it was confirmed by atomic force microscopy that the non compatible fluorosurfactant agglutinates on the resin surface containing a high additive amount was contained in the resin.