1982
DOI: 10.1016/0040-6090(82)90210-3
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Preparation and properties of hard i-C and i-BN coatings

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Cited by 250 publications
(25 citation statements)
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“…[1][2][3]. DLC films can be deposited at fairly low temperatures and at high deposition rates by a variety of methods, including ionbeam deposition, plasma source ion implantation, DC and RF magnetron sputtering, arc-physical vapor deposition (arc-PVD), piasma-enhanced chemical vapor deposition (PECVD), and laser ablation [4][5][6][7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3]. DLC films can be deposited at fairly low temperatures and at high deposition rates by a variety of methods, including ionbeam deposition, plasma source ion implantation, DC and RF magnetron sputtering, arc-physical vapor deposition (arc-PVD), piasma-enhanced chemical vapor deposition (PECVD), and laser ablation [4][5][6][7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3]. DLC films can be deposited at temperatures ranging from subzero to 300"C and at fair]y high deposition rates by a variety of methods, including ion-beam deposition, DC and RF magnetron sputtering, arc-physical vapor deposition (arc-PYD), plasma-enhanced chemical vapor deposition (PECVD), and laser ablation [4][5][6][7][8]. Depending on the deposition method and carbon source, large amounts of hydrogen may be present within the amorphous structure of DLC films [1,3].…”
Section: Introductionmentioning
confidence: 99%
“…Film deposition operation was carried out using a DC-plasma ionization deposition apparatus [11,12]. The schematic diagram of the process chamber of the apparatus is shown in Fig.…”
Section: Methodsmentioning
confidence: 99%