2009
DOI: 10.1007/s10854-009-9856-9
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Preparation and photoelectric properties of Ti doped ZnO thin films annealed in vacuum

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Cited by 14 publications
(7 citation statements)
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“…It is mainly due to the nano/micron range size of ZnO sheets and indicating the effective photoabsorption ability for hetero structure (TiO 2 /ZnO) [28]. This changes in absorbance suggested that the range of photo response can be adjustable by nanocomposites, whereas only TiO 2 is used as photoanode.…”
Section: Uv-vis Studiesmentioning
confidence: 99%
“…It is mainly due to the nano/micron range size of ZnO sheets and indicating the effective photoabsorption ability for hetero structure (TiO 2 /ZnO) [28]. This changes in absorbance suggested that the range of photo response can be adjustable by nanocomposites, whereas only TiO 2 is used as photoanode.…”
Section: Uv-vis Studiesmentioning
confidence: 99%
“…73,74 It is known that when ZnO films are under vacuum annealing, oxygen can be released from the grain boundary and/or lattice of ZnO films increasing V O defects. 75 The red-shift of the absorption edge and E g by adding H 2 has been witnessed by Zhu et al 76 After the hydrogenation, the band gap decreased, which might be due to the passivation of the V O by H + . 73 The red-shift in ZnO has been explained by several authors based on variation of the average particle size.…”
Section: ■ Results and Discussionmentioning
confidence: 90%
“…Compared with the U-ZnO sample, (inset of Figure a), the E g of the vacuum-annealed sample exhibits a blue-shift but a red-shift after hydrogen annealing was also observed. The widening of the band gap can be attributed to the increase of carrier concentration according to the Burstein–Moss effect (B–M). , It is known that when ZnO films are under vacuum annealing, oxygen can be released from the grain boundary and/or lattice of ZnO films increasing V O defects . The red-shift of the absorption edge and E g by adding H 2 has been witnessed by Zhu et al After the hydrogenation, the band gap decreased, which might be due to the passivation of the V O by H + .…”
Section: Resultsmentioning
confidence: 98%
“…15 Although the Ti atoms may incorporate interstitially into the ZnO hexagonal crystal lattices, a moderate concentration of Ti atoms not only reduces the number of Ti 4+ carrier scattering centers, but also increases the grain size of the TZO thin film and increases the optical transmittance. 16 Therefore, in this study, we propose to combine the advantages of Ga and Ti elemental doping in ZnO as a high performance Ga-doped TiZnO (GTZO) for OLED applications. More importantly, the film fabrication does not require expensive equipment for atomic layer deposition (ALD) or metal-organic chemical vapor deposition (MOCVD).…”
Section: Introductionmentioning
confidence: 99%