Preparation and Characterization Study of ZnS Thin Films with Different Substrate Temperatures

Abstract

Zinc sulfide (ZnS) thin films were deposited on a glass and n-type Silicon wafer substrates at temperature range from 50 -200 C o using pulsed laser deposition (PLD) technique. The structural, morphological, optical and electrical properties of the films have been investigated. The XRD analyses indicate that ZnS films have zinc blende structures with plane (111) preferential orientation, whereas the diffraction patterns sharpen with the increase in substrate temperatures. The Atomic Force Microscopy (AFM) Images shows the particle size and surface roughness of the deposited ZnS thin film at substrate temperature 50 and 150 C o were about 62.90nm, 74.68nm respectively. Also we noticed that the surface roughness is increased at substrate temperature 150 C o compared with temperature 50 C o . At 200 C o the formed films exhibit a good optical property with 80% transmittance in the visible region. The electrical properties confirmed that they depend strongly on the bias voltage and the amount of current produced by a photovoltaic device which is directly related to the number of photons absorbed. C-V results demonstrated that the fabricated heterojunction is of abrupt type.

A novel method for ZnO@NiO core–shell nanoparticle synthesis using pulse laser ablation in liquid and plasma jet techniques

“…X-ray diffraction (XRD) was used to examine the crystal structure of the produced ZnO@NiO (ZNO) core–shell NP using a kα-Cu target (λ = 0.15406 nm; the tube was operated at 45 kV, and the scan was acquired over a 2θ range of 20°–70°). The following Debye–Scherrer equation was used to calculate the grain size 16 , 67 : where D is the average crystal size, β is the full width half maximum, k is the Scherrer constant (0.9), λ is the X-ray constant (0.15406 nm), and α is the Braggs angle 53 . The optical characteristics were measured using a UV–Vis spectrophotometer model (Metertech, SP8001 spectrophotometer, Japan) in the 100–1000 nm range at the University of Technology in the Laser and Optoelectronics Engineering Department.…”

“…X-ray diffraction (XRD) was used to examine the crystal structure of the produced ZnO@NiO (ZNO) core-shell NP using a kα-Cu target (λ = 0.15406 nm; the tube was operated at 45 kV, and the scan was acquired over a 2θ range of 20°-70°). The following Debye-Scherrer equation was used to calculate the grain size 16,67 :…”

“…Also, the shell layer could improve the physiochemical properties of the core material, like its catalytic activity and nonlinear properties 9 , leading to new, unique properties that could speed up development in several application fields 10,11 .Research interest in zinc oxide (ZnO) has been increasing, particularly in nanotechnology, to synthesize ZnO on a nanoscale because of its properties and applications [12][13][14][15] . It is crucial in the creation of possible antimicrobial drugs as well as in scientific and technological fields such as nonlinear optics, electrical devices, catalysis, and medicinal applications for their having a large surface area and high crystallinity 16,17 . ZnO NPs have been employed as antibacterial agents due to their effectiveness against pathogen-resistant strains, low toxicity, and heat resistance [18][19][20] .…”