Preparation and characterization of SrTiO3/BaTiO3 thin multilayer films deposited on Pt/Ti/SiO2/Si substrate by radio frequency magnetron sputtering

Huang, Haiyang; Hsiao, Fu-Yuen; Wu, Nan-Chang; Wang, Moo–Chin

doi:10.1016/j.jnoncrysol.2005.10.014

Cited by 8 publications

(5 citation statements)

References 20 publications

(20 reference statements)

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“…The strain reveals a minimum value at 1 Â 10 À5 Torr and then increases as the depositing pressure is increased to 5 Â 10 À5 Torr. The Nelson-Riley function can be utilized to determine the lattice constants because of the minimizing effect of stress [15]:…”

Section: Resultsmentioning

confidence: 99%

Effects of the oxygen pressure on the crystalline orientation and strains of YSZ thin films prepared by E-beam PVD

Kuo

Huang

Yang

2011

Ceramics International

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Section: Resultsmentioning

confidence: 99%

Effects of the oxygen pressure on the crystalline orientation and strains of YSZ thin films prepared by E-beam PVD

Kuo

Huang

Yang

2011

Ceramics International

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“…The relationship between lattice strain (Á) and full width at half maximum value (FWHM,ˇ) can be expressed as Eq. (4) [25]:…”

Section: Resultsmentioning

confidence: 99%

Effects of substrate temperatures on the crystallizations and microstructures of electron beam evaporation YSZ thin films

Huang

Diao

Yang

et al. 2010

Journal of Alloys and Compounds

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“…A detailed schematic diagram of the experimental equipment for this study has been given elsewhere. [21] Before sputtering, the substrate and target were first put on the stand and shielded with a shutter. The sputtering chamber had been evacuated to 2 9 10 À5 Torr by using rotating and oil diffusion pumps and heated to 773 K (500°C).…”

Section: A Samples Preparationmentioning

confidence: 99%

Crystal Structure and Dielectric Characterization of a (SrTiO3/BaTiO3) n Multilayer Film Prepared by Radio Frequency Magnetron Sputtering

Lin

Hsiao

et al. 2010

Metall Mater Trans A

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multilayer films with Pt bottom and top electrodes have been prepared by a double target radio frequency (RF) magnetron sputtering, and their dielectric properties have been characterized as a function of temperature, frequency, bias voltage, and applied voltage. The X-ray diffraction (XRD) pattern reveals that the deposited (SrTiO 3 /BaTiO 3 ) n multilayer films have a designed modulation. The interfaces within the multilayer films appear smooth and dense without any microcracks, and the adhesion is very good. The dielectric constant of the (SrTiO 3 /BaTiO 3 ) n multilayer film increases with increasing layer number (n), and the leakage current density is less than 1 9 10 À8 AAEcm À2 for the applied voltage less than 5 V for the 450-nm-thick (SrTiO 3 /BaTiO 3 ) n multilayer films. The remanent polarization (P r ) and the coercive field (E c ) of the 350-nm-thick (SrTiO 3 /BaTiO 3 ) 4 multilayer films are 7 lCAEcm À2 and 60 kVAEcm À1 , respectively, exhibiting ferroelectricity. (SrTiO 3 /BaTiO 3 ) 4 multilayer films have a high E c and a lower P r , as compared with the bulk BaTiO 3 single crystal. The 450-nm-thick (SrTiO 3 /BaTiO 3 ) 4 multilayer films have a leakage current density-voltage characteristic, which makes them suitable for application in DRAMs capacitors.

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Preparation and characterization of SrTiO3/BaTiO3 thin multilayer films deposited on Pt/Ti/SiO2/Si substrate by radio frequency magnetron sputtering

Cited by 8 publications

References 20 publications

Effects of the oxygen pressure on the crystalline orientation and strains of YSZ thin films prepared by E-beam PVD

Effects of the oxygen pressure on the crystalline orientation and strains of YSZ thin films prepared by E-beam PVD

Effects of substrate temperatures on the crystallizations and microstructures of electron beam evaporation YSZ thin films

Crystal Structure and Dielectric Characterization of a (SrTiO3/BaTiO3) n Multilayer Film Prepared by Radio Frequency Magnetron Sputtering

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