2012
DOI: 10.1039/c2jm14828e
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Precise control of the filling stages in branched nanopores

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Cited by 27 publications
(22 citation statements)
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“…Small imperfections in the alumina barrier and pore structure along the PAA template lead to different local current densities and a heterogeneous material deposition [42]. Therefore, the faster growing pores eventually reach the top of the template and block their neighbors by growing over the adjacent pores in a mushroom-like structure [23], leading to fP values as low as 25%. The heterogeneous j distribution can be verified by XRD measurements where high temperatures produce smaller grain sizes, associated with higher j [ figure 2(b) …”
Section: Temperaturementioning
confidence: 99%
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“…Small imperfections in the alumina barrier and pore structure along the PAA template lead to different local current densities and a heterogeneous material deposition [42]. Therefore, the faster growing pores eventually reach the top of the template and block their neighbors by growing over the adjacent pores in a mushroom-like structure [23], leading to fP values as low as 25%. The heterogeneous j distribution can be verified by XRD measurements where high temperatures produce smaller grain sizes, associated with higher j [ figure 2(b) …”
Section: Temperaturementioning
confidence: 99%
“…Recent results demonstrated [8,10,[21][22][23] that pulsed electrodeposition (PED), is an excellent alternative to the two previous methods. In PED, the reduction of the PAA barrier layer is not performed by chemical etching, which isotropically attacks the alumina, hence reducing the wall and barrier layer thickness alike, usually leading to low PAA homogeneity.…”
Section: Introductionmentioning
confidence: 99%
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“…This may arise because of the breakdown of barrier layer at the relatively high j ed . In fact, due to the non-steady state voltage in the electrodeposition process, a non-uniform filling of PAO template is expected to occur [23]. On the other hand, by performing Cu pre-plating, the corresponding voltage-time curves in Figs.…”
Section: Resultsmentioning
confidence: 98%
“…This kind of barrier layer is a dielectric [22] so that the stability of the electrodeposition is obtained by avoiding dielectric breakdown [4]. Additionally, there is a facility in the pulsed electrodeposition that applies different durations of off-time between pulses in order to limit the hydrogen and heat evolutions at the deposition interface so as to stabilize the process [23]. Using a pulsed ac electrodeposition also improves the pore-filling of PAO templates, uniformity and crystallinity of the arrays of Fe, Co and Ni NWs due to the improvement in the homogeneity of the electrodeposition [13,24,25].…”
Section: Introductionmentioning
confidence: 99%