2015
DOI: 10.1016/j.apsusc.2015.08.104
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Electrodeposition efficiency of Ni in the fabrication of highly ordered nanowire arrays: The roles of Cu pre-plating and barrier layer temperature

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Cited by 11 publications
(6 citation statements)
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“…OPA has many nanoscale pores with a high regularity, and can be easily fabricated via a simple anodizing technique without any special equipment or technique such as photolithography, electron-beam lithography, and nanoimprinting (self-ordering). Therefore, it is widely used by many researchers as a template for novel and challenging nanodevices in the fields of electronic and optical applications [7][8][9][10][11][12][13][14]. It is a well-known experimental fact that the periodic size of the OPA, which is called the -cell size‖ or -interpore distance‖, strongly depends on the applied potential difference (voltage) and electrolyte species used for anodizing in the aqueous solutions [2,5,15,16].…”
Section: Introductionmentioning
confidence: 99%
“…OPA has many nanoscale pores with a high regularity, and can be easily fabricated via a simple anodizing technique without any special equipment or technique such as photolithography, electron-beam lithography, and nanoimprinting (self-ordering). Therefore, it is widely used by many researchers as a template for novel and challenging nanodevices in the fields of electronic and optical applications [7][8][9][10][11][12][13][14]. It is a well-known experimental fact that the periodic size of the OPA, which is called the -cell size‖ or -interpore distance‖, strongly depends on the applied potential difference (voltage) and electrolyte species used for anodizing in the aqueous solutions [2,5,15,16].…”
Section: Introductionmentioning
confidence: 99%
“…Herein, after obtaining the optimal conditions for the Cu pre-plating process using V t =12 V (corresponding to TH b =16 nm), it is necessary to optimize the thickness of alumina barrier layer for the subsequent growth of magnetic and metallic NWs. The reason for this is that the Cu preplating at the dendritic sections improves the conductivity which may influence the corresponding structural and chemical properties of the barrier layer [22,56]. To this end, we verified the EE and F p values of Ni by full filling of the AAO templates in the range 10 nm<TH b <21 nm, as described in the experimental section.…”
Section: Obtaining Optimal Barrier Layer Thicknessmentioning
confidence: 94%
“…This leads to the formation of nanopore arrays in AAO template with a length of approximately 16 μm, a diameter of 30 nm and an interpore distance of 105 nm [53,54]. To facilitate the PED process, the thickness of alumina barrier layer was first reduced by exponentially decreasing V t from 40 to 12 V as formulated in [56], thereby creating dendrites at the pores' bottom. In the electrochemical cell, the remaining Al of the AAO template and a roll of graphite were served as the working and counter electrodes, respectively.…”
Section: Methodsmentioning
confidence: 99%
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“…The alternative to expensive and elaborate methods currently used in the fabrication of NW arrays is the use of the pulsed ED deposition into highly ordered nanopores of mild and hard anodized AAO templates. In this regard, the PAED method has been proposed as a large-scale electrochemical preparation method, enabling the experimentalists to control F p and length uniformity of free-standing nonmagnetic and magnetic metal NWs [79,103,107]. In the following, the PAED strategies developed in the optimized filling of the branched or dendritic sections, and subsequent aligned nanopores of mild and hard anodized templates are presented.…”
Section: Paedmentioning
confidence: 99%