Abstract:Chemical etching in phosphoric acid was employed for postgrowth modification of magnetic bubble domain collapse field (H0) of epitaxially grown (YSmCa)a(FeGe)5012 magnetic garnet layers. The dependenee of the etching process on the etching conditions, the etching tate and the magnetic and surfaee features of the layers was investigated. Ir is possible to aehieve a pre-determined ehange in the eollapse field solely by controlling the etching time at a given temperature. For etching at 140 ~ the etehing rate is … Show more
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