2021
DOI: 10.1016/j.mseb.2021.115063
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Post oxidation in improving the Schottky-gate MgZnO/ZnO heterojunction field-effect transistors fabricated by RF sputtering

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Cited by 9 publications
(5 citation statements)
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“…Recently, MgZnO/ZnO heterostructures received significant attention as a substantial subset of semiconductor junctions since ZnO materials are having fascinating properties such as low growth temperature, high exciton binding energy, higher saturation velocity, lower lattice mismatch, accessibility of large-area ZnO substrates, and relatively low material costs. Therefore, MgZnO/ZnO heterostructure based devices are used in various applications like thin film transistor (TFT) [30], photodetector [31], FET [32], light waveguide [33], etc However, to the Authors knowledge, no work on the HEMT has been reported as evident in the literature explaining the graded MgZnO/ZnO HEMT for biosensor applications. In contrast to traditional abrupt MgZnO/ZnO heterostructures, the graded MgZnO/ZnO heterostructure region can exhibit stronger 2-DEG formation at its interface [34].…”
Section: Introductionmentioning
confidence: 99%
“…Recently, MgZnO/ZnO heterostructures received significant attention as a substantial subset of semiconductor junctions since ZnO materials are having fascinating properties such as low growth temperature, high exciton binding energy, higher saturation velocity, lower lattice mismatch, accessibility of large-area ZnO substrates, and relatively low material costs. Therefore, MgZnO/ZnO heterostructure based devices are used in various applications like thin film transistor (TFT) [30], photodetector [31], FET [32], light waveguide [33], etc However, to the Authors knowledge, no work on the HEMT has been reported as evident in the literature explaining the graded MgZnO/ZnO HEMT for biosensor applications. In contrast to traditional abrupt MgZnO/ZnO heterostructures, the graded MgZnO/ZnO heterostructure region can exhibit stronger 2-DEG formation at its interface [34].…”
Section: Introductionmentioning
confidence: 99%
“…Among them, due to the lack of insulation layer capacitance, the junction FET (JFET) requires low gate driving power, a simple preparation process, and can achieve smaller device size. At present, there have been many studies on ZnO-based FETs [ 22 , 23 , 24 , 25 , 26 , 27 ], but most of them are the metal-oxide-semiconductor FETs (MOSFETs) or metal-semiconductor FETs (MESFETs), and there is less theoretical and experimental research on ZnO-based JFETs [ 28 , 29 ]. In 2019, Nan Guo et al prepared a light-driven WSe 2 -ZnO JFET with n-ZnO nanosheets as the gate material, and the device’s optical response reached 4.83 × 10 3 A/W, with a response time of 10 μs [ 29 ].…”
Section: Introductionmentioning
confidence: 99%
“…6,10,11 Sasa et al, 12 Koike et al, 13 and Ye et al 14 have realized high-quality epitaxially grown MgZnO/ZnO (MZO) based HFET. Moreover, reports of realizing high 2DEG yielding sputtered 6,9,15,16 MZO heterostructures are available in the literature, suggesting the possibility of achieving large-area and therefore, low-cost ZnO-based power HFETs.…”
Section: Introductionmentioning
confidence: 99%