2020
DOI: 10.1134/s1063783420020201
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Possibilities of Characterizing the Crystal Parameters of CdxHg1 – xTe Structures on GaAs Substrates by the Method of Generation of the Probe-Radiation Second Harmonic in Reflection Geometry

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Cited by 8 publications
(20 citation statements)
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“…The structural crystal perfection of the substrate and the MBE MCT HES layers was measured at the room temperature by the SHG method ex situ on the highsensitive laboratory test bench for the non-linear optical diagnostics, which operation is described in detail [27,28]. The average power for SHG was changed within the range 0.01 to 0.07 W by means of the Nd : YAG-laser.…”
Section: Samples and Experimental Proceduresmentioning
confidence: 99%
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“…The structural crystal perfection of the substrate and the MBE MCT HES layers was measured at the room temperature by the SHG method ex situ on the highsensitive laboratory test bench for the non-linear optical diagnostics, which operation is described in detail [27,28]. The average power for SHG was changed within the range 0.01 to 0.07 W by means of the Nd : YAG-laser.…”
Section: Samples and Experimental Proceduresmentioning
confidence: 99%
“…The SH polarization components dependence intensity on the mutual orientation of the polarization of excitation radiation in reference to the crystallophysical axes was measured, whereby the experiment recorded the SH polarization parallel to the azimuthally changing linear polarization of the excitation radiation (hereinafter referred to as the azimutal dependence). The experimental and numerical model data for the ideal crystal in a given local area were analyzed to obtain the quantitative information about the crystal state of the subsurface layer, its orientation and the growing layers orientation rotation within the plane and the growth direction, as well as a number of other characteristics with an error no worse one degree [26][27][28][29][34][35][36][37][38][39][40]. The crystal state of the MCT layers was measured by azimuthal SH signal intensity dependence measurement with layerby layer etching.…”
Section: Samples and Experimental Proceduresmentioning
confidence: 99%
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