2015
DOI: 10.1002/app.42292
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POSS‐based molecular hybrids with low dielectric constant: Effect of chemical structure and molecular architecture

Abstract: Three kinds of hybrids with different architectures including dumbbell-type, bead-type, and cross-linked structure, were prepared via the Heck reaction between octavinyl-polyhedral oligomeric silsesquioxane (OV-POSS) and different bromo-substituted aromatic amide monomers. The molecular architecture can be successfully achieved by simply varying the feed ratio of OV-POSS to monomers. Their structure and properties were characterized by FTIR, 1 H NMR, 29 Si NMR, provide the expansion for FTIR and NMR] All the P… Show more

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Cited by 9 publications
(14 citation statements)
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“…These values decrease steadily with the increased loading of the POSS-NH– groups because the POSS-based solids possess what is essentially a nanoporous structure. This can effectively decrease the dielectric constant due to the increased free volume in these polymers. ,, Specifically, the high porosity of the POSS-polyphosphazene-TFE systems result from the nanometer scale porous structure surrounding the POSS units, and this markedly reduces the dielectric constant.…”
Section: Resultsmentioning
confidence: 99%
See 2 more Smart Citations
“…These values decrease steadily with the increased loading of the POSS-NH– groups because the POSS-based solids possess what is essentially a nanoporous structure. This can effectively decrease the dielectric constant due to the increased free volume in these polymers. ,, Specifically, the high porosity of the POSS-polyphosphazene-TFE systems result from the nanometer scale porous structure surrounding the POSS units, and this markedly reduces the dielectric constant.…”
Section: Resultsmentioning
confidence: 99%
“…The frequency used for the DEA experiments was 100 kHz, and the capacitance (ε) was monitored at 25 °C. The permittivity (ε) was calculated based on the equation where ε is the dielectric constant, C is the capacitance, d is the thickness of the films, A is the area of top Ag electrode, and ε 0 is the permittivity of free space …”
Section: Methodsmentioning
confidence: 99%
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“…[9,10] Therefore, most studies reported in recent years have focused on the hightemperature resistant polymeric dielectric materials with excellent heat resistance and stability of thermal movement of molecular chains. [11][12][13][14] To develop various high-temperature resistant, low dielectric constant, and low dielectric loss polymeric materials with different structures, many efforts have been done including the introduction of cross-linked network into molecular chain [15][16][17][18][19][20][21][22][23] and the promotion of thermal conductivity. [24][25][26] Fluorinated poly(aryl ether) (FPAE), as high performance polymeric material, [27,28] has been widely studied owing to their high thermal stability, excellent mechanical strength, and low dielectric constant.…”
Section: Doi: 101002/marc202000100mentioning
confidence: 99%
“…[ 9,10 ] Therefore, most studies reported in recent years have focused on the high‐temperature resistant polymeric dielectric materials with excellent heat resistance and stability of thermal movement of molecular chains. [ 11–14 ] To develop various high‐temperature resistant, low dielectric constant, and low dielectric loss polymeric materials with different structures, many efforts have been done including the introduction of cross‐linked network into molecular chain [ 15–23 ] and the promotion of thermal conductivity. [ 24–26 ]…”
Section: Figurementioning
confidence: 99%