Portable phase measuring interferometer using Shack-Hartmann method

Fujii, Tôru; Kougo, Jun; Mizuno, Yasushi; Ooki, Hiroshi; Hamatani, Masato

doi:10.1117/12.482699

Cited by 18 publications

(11 citation statements)

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“…The results of any wavefront measurement tool are applicable if the results are in Fringe Zernike format. For example, the measurement results of Nikon PMI, portable PMI 6) and Litel ISI 7) are usable. Using above two data, the initial performance at 33 points in the 25x8mm exposure field are calculated.…”

Section: Software System and Input / Output Datamentioning

confidence: 99%

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Aberration optimizing system using Zernike sensitivity method

et al. 2003

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We introduce a projection lens adjustment procedure that is customer application oriented. This technique is based on the simulated imaging performance using Zernike sensitivity 1) , the measurement results of wavefront aberration and wavefront change by lens element position change. This system finds the optimum combination of lens position where the amount of specific imaging performance error is in tolerance. In this paper, the idea of optimization and some optimization results are shown.

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Section: Software System and Input / Output Datamentioning

confidence: 99%

“…In the first step of this experiment, we measured the wavefront with an interferometer 6) , and using Zernike sensitivity method, some types of initial performance are simulated. In the next step, the lens position and lens movable range data are picked up from the scanner.…”

Section: Experimental Conditionsmentioning

confidence: 99%

Aberration optimizing system using Zernike sensitivity method

et al. 2003

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“…Based on the lateral shearing interferometer principle, ASML has developed the integrated lens interferometer at scanner 0003-6935/09/193654-10$15.00/0 © 2009 Optical Society of America (ILIAS) technique, and its repeatable accuracy achieves 2:5 mλ [7]. Based on the Shack-Hartman interferometer principle, Nikon has also developed its own technique, the integrated projecting optics tester (iPot), with a measurement repeatability of 2:2 mλ [4,8]. The in situ aberration measurement techniques based on the interferometer principle can achieve highly repeatable measurement accuracy.…”

Section: Introductionmentioning

confidence: 99%

“…Several in situ measurement techniques based on different measurement principles have been all available [2][3][4][5][6][7][8]. Based on the line diffraction interferometer principle, Canon has developed the in situ phase measurement interferometer (iPMI) technique [6], which is used on the 45 nm hp devices enabled lithographic tools FPA-7000AS7 and has a measurement repeatability of 2 mλ [2,5].…”

Section: Introductionmentioning

confidence: 99%

Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations

Qiu

Wang

et al. 2009

Appl. Opt.

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A linear measurement model of lithographic projection lens aberrations is studied numerically based on the Hopkins theory of partially-coherent imaging and positive resist optical lithography (PROLITH) simulation. In this linearity model, the correlation between the mark's structure and its sensitivities to aberrations is analyzed. A method to design a mark with high sensitivity is proved and declared. By use of this method, a translational-symmetry alternating phase shifting mask (Alt-PSM) grating mark is redesigned with all of the even orders, AE3rd and AE5th order diffraction light missing. In the evaluation simulation, the measurement accuracies of aberrations prove to be enhanced apparently by use of the redesigned mark instead of the old ones.

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“…The Shack-Hartmann method is used in iPot (an integrated projecting optics tester) by Nikon Corporation [4,5]. A pinhole for generating ideal spherical wave is used in iPot, and the pinhole is enlarged carefully to reduce the measuring time.…”

Section: Introductionmentioning

confidence: 99%

Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width

et al. 2009

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The correlation between the coma sensitivity of the alternating phase-shifting mask (Alt-PSM) mark and the mark's structure is studied based on the Hopkins theory of partially coherent imaging and positive resist optical lithography (PROLITH) simulation. It is found that an optimized Alt-PSM mark with its phase width being two-thirds its pitch has a higher sensitivity to coma than Alt-PSM marks with the same pitch and the different phase widths. The pitch of the Alt-PSM mark is also optimized by PROLITH simulation, and the structure of p ¼ 1:92λ=NA and pw ¼ 2p=3 proves to be with the highest sensitivity. The optimized Alt-PSM mark is used as a measurement mark to retrieve coma aberration from the projection optics in lithographic tools. In comparison with an ordinary Alt-PSM mark with its phase width being a half its pitch, the measurement accuracies of Z 7 and Z 14 apparently increase.

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Portable phase measuring interferometer using Shack-Hartmann method

Cited by 18 publications

References 0 publications

Aberration optimizing system using Zernike sensitivity method

Aberration optimizing system using Zernike sensitivity method

Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations

Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width

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