2011
DOI: 10.1109/ted.2011.2169070
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Polymer Solid-Electrolyte Switch Embedded on CMOS for Nonvolatile Crossbar Switch

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Cited by 67 publications
(64 citation statements)
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“…The switch stack on the Cu electrode is composed of TiO 2 /PSE/Ru/Ta. The Ti metal layer with 1-nm thickness, which is an oxygen absorber, is deposited on the Cu electrode to prevent the Cu surface from oxidation before forming a 5-nm thick PSE [14]. Ti is fully oxidized during the fabrication process.…”
Section: Atom Switchmentioning
confidence: 99%
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“…The switch stack on the Cu electrode is composed of TiO 2 /PSE/Ru/Ta. The Ti metal layer with 1-nm thickness, which is an oxygen absorber, is deposited on the Cu electrode to prevent the Cu surface from oxidation before forming a 5-nm thick PSE [14]. Ti is fully oxidized during the fabrication process.…”
Section: Atom Switchmentioning
confidence: 99%
“…Precipitated metal forms the conductive bridge between the two electrodes (Cu and Ru). The set voltage for the first cycle, which corresponds to the forming voltage, is similar to the set voltage for the second cycle (∼2.2 V) [14], [15]. The set current is controlled at 400 μA by nMOSFET which is connected in series, resulting in the ON resistance of ∼500 Ω.…”
Section: Atom Switchmentioning
confidence: 99%
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“…Figure 2 (a) shows a tradeoff relationship between on/off ratio and endurance in emerging nonvolatile memories. Figure 2 (b) shows a concept of a crossbar switch integrated in BEOL [2,3], where the atom switches are densely-packed and directly route signals flexibly. The replacement of the switch block reduces the chip area, lowering dynamic power consumption.…”
Section: Introductionmentioning
confidence: 99%