In the present paper, we describe the synthesis and
characterization of a novel negative-type soluble photosensitive polyimide (PSPI). A group of new
photosensitive polyimides
has been prepared by condensation of dianhydrides bearing photoreactive
ester groups and
aromatic diamines in N-methylpyrrolidone (NMP), followed by
chemical imidization using
acetic anhydride without acid acceptors such as pyridine or
triethylamine. Thus, the starting
monomer used in the synthesis of a commercial aromatic polyimide has
been chemically
modified with four different photosensitive groups (chlorine-free
synthesis). All the
intermediates as well as the resulting polymers have been
characterized. The PSPI esters
were found to be soluble in N-alkyl-substituted amides.
Their irradiation with UV light
induces cross-linking of the photoreactive ester groups. These
systems change from being
weakly to being heavily cross-linked during irradiation and do not
swell during development.
The remaining PSPI esters do not require thermal imidization
because they are already
imidized, and shrinkage is about 20% due to volatilization of
photoreactive groups.