1996
DOI: 10.1002/marc.1996.030170108
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Poly(silamine)s as new electron‐beam resist materials

Abstract: Several types of poly(si1amine)s were prepared and their structure-characteristics relationships were investigated. When a phenyl ring in the organosilyl unit and/or a cyclic structure in the amino unit was introduced, the glass transition temperatures were increased significantly in order to increase film formability. From the thermogravimetric analysis of the poly(silamine)s, it was found that the thermal decomposition of poly(si1amine)s starts at ca. 380-400°C. On electron-beam irradiation of the poly(si1am… Show more

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Cited by 5 publications
(3 citation statements)
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“…We have recently been studying a new molecular design for the creation of a high performance positive EB resist. [1] One of the studies was to utilize poly(amethylstyrene) (PMS) with the easier depolymerization characteristics. [2] [3] PMS is one of the wellknown polymers which induces depolymenzation at ambient temperature due to the low T~ (ca.…”
Section: Introductionmentioning
confidence: 99%
“…We have recently been studying a new molecular design for the creation of a high performance positive EB resist. [1] One of the studies was to utilize poly(amethylstyrene) (PMS) with the easier depolymerization characteristics. [2] [3] PMS is one of the wellknown polymers which induces depolymenzation at ambient temperature due to the low T~ (ca.…”
Section: Introductionmentioning
confidence: 99%
“…We have recently been studying a new molecular design for the creation of a high performance positive EB resist. [1] One of the studies was to utilize poly(amethylstyrene) (PMS) with the easier depolymerization characteristics. [2] [3] PMS is one of the wellknown polymers which induces depolymerization at ambient temperature due to the low T~ (ca.…”
Section: Introductionmentioning
confidence: 99%
“…[3] Very recently, we have started a new molecular design for the creation of a high performance positive EBresist. [4] Polymers having a low ceiling temperature (Ta) have been investigated for the positive type resist utilizing their depolymerization characteristics. [5] For example, poly(phthalaldehyde) (PPHA), which shows a T~ of ca.…”
Section: Introductionmentioning
confidence: 99%