2-Phenylallyl-ended Poly(.ALPHA.-Methylstyrene): A New Positive Electron-Beam Resist.

Synthesis of 2-Phenylallyl-ended Ply(.ALPHA.-Methylstyrene) and Application for Electron-Beam Resist.

“…End functionality was determined by GPC analysis of degradation experiments which was described in our previous paper. [2] 2.3. Resist Processing:…”

“…[1] One of the studies was to utilize poly(amethylstyrene) (PMS) with the easier depolymerization characteristics. [2] [3] PMS is one of the wellknown polymers which induces depolymerization at ambient temperature due to the low T~ (ca. 0 °C).…”

Dry-Developable Electron-Beam Resist. Synthesis and Resist Characteristic Evaluation of Amino-ended Poly(.ALPHA.-Methylstyrene).

“…[1] One of the studies was to utilize poly(amethylstyrene) (PMS) with the easier depolymerization characteristics. [2] [3] PMS is one of the wellknown polymers which induces depolymenzation at ambient temperature due to the low T~ (ca. 0 °C).…”