2005
DOI: 10.1364/opex.13.010163
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Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm

Abstract: In this paper we study the effect of contamination induced by fabrication process on laser damage density of fused silica polished parts at 351 nm in nanosecond regime. We show, owing to recent developments of our raster scan metrology, that a good correlation exists between damage density and concentration of certain contaminants for the considered parts.

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Cited by 203 publications
(96 citation statements)
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“…We can also notice that for the samples with low CeO 2 contents (S2, S3, and S4), this correlation is weaker, and it has a good agreement with experimental data on CeO 2 contents dependence of damage density. 26 In the case of CeO 2 impurities, as the dramatic decrease of the contents from samples S1 to S4, the damage density will decrease according to our calculation. As a consequence, the damage probability induced by the laser pulse with same fluence will decrease.…”
Section: Methodsmentioning
confidence: 55%
“…We can also notice that for the samples with low CeO 2 contents (S2, S3, and S4), this correlation is weaker, and it has a good agreement with experimental data on CeO 2 contents dependence of damage density. 26 In the case of CeO 2 impurities, as the dramatic decrease of the contents from samples S1 to S4, the damage density will decrease according to our calculation. As a consequence, the damage probability induced by the laser pulse with same fluence will decrease.…”
Section: Methodsmentioning
confidence: 55%
“…Under the combined work of mechanical and chemical actions, the optical materials are removed, leaving the subsurface damage (SSD) distributed beneath the polished surface. The SSD distribution profile is presented in Figure 2, which includes re-deposition, defect and deformed layers [17,26,31,43]. The re-deposition layer consists of impurity defects and silica compounds, resulting from the hydrolysis reaction of fused silica.…”
Section: Sample Preparation Ssd Removal and Etching Process Charactmentioning
confidence: 99%
“…With the application of advanced testing techniques like synchrotron radiation X-ray fluorescence (SXRF) and secondary ion mass spectrometry (SIMS), it has been previously reported [17,18,20,22,25] that the precision grinding and polishing of optical materials can probably introduce impurity defects with sub-wavelength size on the processed surface or subsurface. The impurity defects mainly contain cerium oxide (CeO 2 ), zirconium dioxide (ZrO 2 ), iron (Fe), aluminum (Al), chromium (Cr) and so on [17,20,25].…”
Section: Introductionmentioning
confidence: 99%
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“…Beckwitt et al [6] used cascade quadratic nonlinearity to compensate self-focusing. Another factor influencing the intensity is defects in the optical elements [7,8] . The presence of defects may lead to a more complex intensity distribution and worse beam quality, and may even cause small-scale self-focusing which may damage optical elements [9,10] .…”
Section: Introductionmentioning
confidence: 99%