2016
DOI: 10.1088/0022-3727/49/29/295304
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Polarisation dependence of Schottky barrier heights at ferroelectric BaTiO3 / RuO2interfaces: influence of substrate orientation and quality

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Cited by 25 publications
(23 citation statements)
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“…The Fermi level position at the SrTiO 3 :Nb/RuO 2 interface is rather independent on deposition conditions with E F − E VB =1.85±0.1 eV (see Figure ). This value is at the lower limit of Fermi levels observed at any SrTiO 3 surfaces or interfaces, and in line with high barriers formed by RuO 2 on a number of other n ‐type semiconducting oxides . Due to the rather high work function of RuO 2 of 6−6.5 eV, a low Fermi level position at the interface is expected.…”
Section: Discussionsupporting
confidence: 76%
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“…The Fermi level position at the SrTiO 3 :Nb/RuO 2 interface is rather independent on deposition conditions with E F − E VB =1.85±0.1 eV (see Figure ). This value is at the lower limit of Fermi levels observed at any SrTiO 3 surfaces or interfaces, and in line with high barriers formed by RuO 2 on a number of other n ‐type semiconducting oxides . Due to the rather high work function of RuO 2 of 6−6.5 eV, a low Fermi level position at the interface is expected.…”
Section: Discussionsupporting
confidence: 76%
“…This is within the range of effective screening lengths provided by Stengel et al. It is also in reasonable agreement with barrier modifications observed during polarization reversal at BaTiO 3 /RuO 2 interfaces . The observed change in binding energy and appearance of Ti 3+ after degradation is therefore also consistent with scenario B.…”
Section: Discussionmentioning
confidence: 93%
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“…Besides, different contributions can also modify the measured ferroelectric properties in a extrinsic manner. [19][20] Probably, the most well-known extrinsic contributions that can modify the measured ferroelectric properties are the leakage currents, 19,[21][22][23] the interfaces between the metal and the ferroelectric, [24][25][26][27][28] and parasitic capacitance of the measuring circuit (of relevance when characterizing nanosized capacitors by using proximity probes). [29][30][31][32] Figure 1.…”
Section: Introductionmentioning
confidence: 99%
“…The bent-band structure of pn junctions has been observed by transmission electron microscopy 14 ; however, the actual occurrence of FEBS remains unproven experimentally. One of the crucial problems that need to be further clarified is the fact that the actual location of the FEBS is not known [15][16][17] . Therefore achieving the fundamental understanding for the energy shift of atomic orbitals in terms of their depth profile is an important basis for understanding the electronic structure in ferroelectrics.…”
mentioning
confidence: 99%