PLD Deposited ZnO Films on Different Substrates and Oxygen Pressure: A Study of Surface Morphology and Optical Properties

Singh, Jai; Srivastava, Pankaj; Siwach, P. K.; Singh, H. K.; Tiwari, Rajiv; Srivastava, O.N.

doi:10.1166/sam.2012.1303

Cited by 14 publications

(4 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…As previously stated, the target is usually irradiated at an angle between 45 and 60 • . Common substrate materials usually used in PLD are yttrium stabilized zirconium oxide (YSZ), strontium titanate (SrTiO 3 ) [58], magnesium oxide (MgO) and sapphire (Al 2 O 3 ) [59,60]. Some semiconductors such as silicon (Si), gallium oxide (β-Ga 2 O 3 ) [61], fused silica (SiO 2 ) [62], zinc oxide (ZnO) and gallium arsenide (GaAs) [60] have also been used as substrates.…”

Section: Methodsmentioning

confidence: 99%

Latest Development on Pulsed Laser Deposited Thin Films for Advanced Luminescence Applications

2020

View full text Add to dashboard Cite

Currently, pulsed laser deposition (PLD) is a widely used technique to grow thin films for academic research and for industrial applications. The PLD has superior advantages including versatility, control over the growth rate, stoichiometric transfer and unlimited degree of freedom in the ablation geometry compared to other deposition techniques. The primary objective of this review is to revisit the basic operation mechanisms of the PLD and discuss recent modifications of the technique aimed at enhancing the quality of thin films. We also discussed recent progress made in the deposition parameters varied during preparation of luminescent inorganic oxide thin films grown using the PLD technique, which include, among others, the substrate temperature. The advanced technological applications and different methods for film characterization are also discussed. In particular, we pay attention to luminescence properties, thickness of the films and how different deposition parameters affect these properties. The advantages and shortcomings of the technique are outlined.

show abstract

Section: Methodsmentioning

confidence: 99%

Latest Development on Pulsed Laser Deposited Thin Films for Advanced Luminescence Applications

2020

View full text Add to dashboard Cite

show abstract

“…Each Ti foil (550.01 cm 3 in size) was immersed in 50 ml 30 mass% H 2 O 2 solution which contained 15 mg melamine (C 3 H 6 N 6 ) and 1.0 ml 63 mass% HNO 3 , and maintained at 80 C for 72 h in an oven [18]. The specimen were then rinsed in distilled water, dried at 80 C, and subjected to a thermal treatment at 450 C for 1 h in air before the subsequent PLD growth of ZnO for 15, 30, 45 and 60 min, using a ZnO disk (20 mm in diameter) as a target in an oxygen atmosphere with a partial pressure of ca.…”

Section: Pulsed Laser Deposition Of Zno On Tio 2 Nanowire Arraymentioning

confidence: 99%

Conformal growth of ZnO on TiO2 nanowire array for enhanced photocatalytic activity

Tao¹,

Wu²,

Xiao³

et al. 2013

Applied Surface Science

View full text Add to dashboard Cite

Highlights TiO 2 nanowire array is achieved by direct oxidation of Ti in H 2 O 2 solution at a low temperature of 80 C. A subsequent pulsed laser deposition of ZnO on the TiO 2 nanowire array achieves core-shell TiO 2 /ZnO nanoarrays. The PLD ZnO layer is oriented grown to exhibit an abnormal strong X-ray peak corresponding to (002). The composite film exhibits improved photocurrent and photocatalytic activity.

show abstract

“…Various applications of ZnO include transparent conductors [1], UV detectors [2], gas sensors [3], photo detectors [4], surface acoustic wave devices [5], varistors [6] and so on. Different vacuum deposition techniques have been used to grow ZnO thin films such as sputtering [7], chemical vapor deposition (CVD) [8], pulsed laser deposition (PLD) [9], molecular beam epitaxy (MBE) [10], atomic layer deposition (ALD) [11] etc. Among these sputtering is a promising method which can provide a smooth and uniform thin film with good adhesion and better crystallinity.…”

Section: Introductionmentioning

confidence: 99%

Effect of substrate temperature and RF power on the structural and optical properties of sputtered ZnO thin films

Hajara

Rose

Saji

2022

J. Phys.: Conf. Ser.

View full text Add to dashboard Cite

ZnO thin films have been deposited on glass substrates by radio frequency (RF) magnetron sputtering from a zinc oxide target in order to investigate the effect of RF power and substrate temperature on the properties of the deposited films. The structural and optical properties of the films were characterized by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), UV-Vis transmission spectra and photoluminescence (PL). All ZnO thin films exhibited diffraction peak of (002) corresponding to c-axis orientation and the film deposited at 450°C exhibited the larger grain size as a result of stress relaxation. It is observed that the increase in substrate temperature or sputtering power can facilitate the growth of ZnO in (100) and (101) direction. PL emission was obtained at UV and visible region for the excitation wavelengths of 280 nm and 390 nm respectively. PL study indicated that both the crystal quality and stoichiometry can influence the UV PL emission in ZnO thin films. Dependence of temperature and power on transmission spectra was studied and the optical band gap was calculated.

show abstract

PLD Deposited ZnO Films on Different Substrates and Oxygen Pressure: A Study of Surface Morphology and Optical Properties

Cited by 14 publications

References 0 publications

Latest Development on Pulsed Laser Deposited Thin Films for Advanced Luminescence Applications

Latest Development on Pulsed Laser Deposited Thin Films for Advanced Luminescence Applications

Conformal growth of ZnO on TiO2 nanowire array for enhanced photocatalytic activity

Effect of substrate temperature and RF power on the structural and optical properties of sputtered ZnO thin films

Contact Info

Product

Resources

About