2013 IEEE International Ultrasonics Symposium (IUS) 2013
DOI: 10.1109/ultsym.2013.0277
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Platinum/AlN/Sapphire SAW resonator operating in GHz range for high temperature wireless SAW sensor

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Cited by 17 publications
(15 citation statements)
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“…K 2 is the electrical-mechanical coupling coefficient of the piezoelectric material, and can be derived experimentally through the serial and parallel resonant frequencies (f s and f p , respectively) of the SAWR [ 21 , 22 ]: …”
Section: Modelingmentioning
confidence: 99%
“…K 2 is the electrical-mechanical coupling coefficient of the piezoelectric material, and can be derived experimentally through the serial and parallel resonant frequencies (f s and f p , respectively) of the SAWR [ 21 , 22 ]: …”
Section: Modelingmentioning
confidence: 99%
“…The electromechanical coupling factors k 2 indicate the effectiveness with which a piezoelectric material converts electrical energy into mechanical energy or vice versa. The k 2 was determined using measured and simulated data for the parameter (reflection) and the following Equation (18) derived from [ 18 ]: …”
Section: Resultsmentioning
confidence: 99%
“…At room temperature (23 • C), the value of the electromechanical coupling coefficient of our modeled device is 1.812% and the measured value is 1.868%. Figure 7 presents a comparison of the variation in electromechanical coupling as a function of the temperature obtained from the experimental measurements and the simulations of the Pt/AlN/Sapphire sensor [18]. Figure 7 shows that the k 2 coefficient increases with temperature.…”
Section: Electromechanical Coefficient Factor Kmentioning
confidence: 99%
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“…Moreover, because of its wide bandgap of 6.2 eV, AlN has outstanding dielectric properties, superior to those of langasite by several orders of magnitudes at any temperature [15]. In addition, SAW velocities in AlN are close to 5500 m/s, making this material suitable for applications in the most promising industrial, scientific, and medical (ISM) 2.45 GHz band [16]. In this context, sapphire substrates are highly compatible with AlN films as they show concurrently high temperature stability, high dielectric properties, comparable SAW velocities, and they enable the growth of highly textured AlN films [17].…”
Section: Introductionmentioning
confidence: 99%