Plateholder design for deposition of uniform diamond coatings on WC-Co substrates by microwave plasma CVD for efficient turning application

Ashkihazi, E. E.; Седов, В. С.; Sovyk, D. N.; Хомич, А. А.; Bolshakov, A. P.; Ryzhkov, S. G.; Хомич, А. В.; Vinogradov, Dmitry; Ralchenko, V.G.; Konov, V. I.

doi:10.1016/j.diamond.2017.04.011

Cited by 27 publications

(8 citation statements)

References 22 publications

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“…The main idea of this work reflects the progress in the field of single-crystal diamond growth, where the classical flat holder design [30][31][32] is gradually dismissed in favor of either pedestal- [31][32][33] or pocket-holders [34][35][36][37]. We also note that holder design also has a significant effect on the quality and adhesion of PCD covers on WC-Co cutting tools [38].…”

Section: Introductionmentioning

confidence: 95%

Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD

et al. 2020

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In this work, the substrate holders of three principal geometries (flat, pocket, and pedestal) were designed based on E-field simulations. They were fabricated and then tested in microwave plasma-assisted chemical vapor deposition process with the purpose of the homogeneous growth of 100-μm-thick, low-stress polycrystalline diamond film over 2-inch Si substrates with a thickness of 0.35 mm. The effectiveness of each holder design was estimated by the criteria of the PCD film quality, its homogeneity, stress, and the curvature of the resulting “diamond-on-Si” plates. The structure and phase composition of the synthesized samples were studied with scanning electron microscopy and Raman spectroscopy, the curvature was measured using white light interferometry, and the thermal conductivity was measured using the laser flash technique. The proposed pedestal design of the substrate holder could reduce the stress of the thick PCD film down to 1.1–1.4 GPa, which resulted in an extremely low value of displacement for the resulting “diamond-on-Si” plate of Δh = 50 μm. The obtained results may be used for the improvement of already existing, and the design of the novel-type, MPCVD reactors aimed at the growth of large-area thick homogeneous PCD layers and plates for electronic applications.

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Section: Introductionmentioning

confidence: 95%

Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD

et al. 2020

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“…To minimize the influence of edge effects, which is typical for all types of CVD growth (e.g., see [49]), 1 mm wide strips were laser-cut from each side of each sample, including the HFCVD-grown one, so their final size was 17 × 17 mm 2 .…”

Section: Methodsmentioning

confidence: 99%

Combined HF+MW CVD Approach for the Growth of Polycrystalline Diamond Films with Reduced Bow

et al. 2023

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A combination of two methods of chemical vapor deposition (CVD) of diamond films, microwave plasma–assisted (MW CVD) and hot filament (HF CVD), was used for the growth of 100 µm-thick polycrystalline diamond (PCD) layers on Si substrates. The bow of HF CVD and MW CVD films showed opposite convex\concave trends; thus, the combined material allowed reducing the overall bow by a factor of 2–3. Using MW CVD for the growth of the initial 25 µm-thick PCD layer allowed achieving much higher thermal conductivity of the combined 110 µm-thick film at 210 W/m·K in comparison to 130 W/m·K for the 93 µm-thick pure HF CVD film.

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“…High hardness and thermal conductivity, wear resistance and chemical inertness are the key properties of diamond-based materials [1][2][3], so polycrystalline diamond (PCD) films and composites [4][5][6] can be used in heat sinks [7][8][9][10], hard coatings for cutting tools [11][12][13] and protective layer applications [14][15][16]. Based on the average size of diamond grains, polycrystalline diamond materials are classified as microcrystalline (MCD), nanocrystalline (NCD) and ultrananocrystalline (UNCD) [17][18][19][20].…”

Section: Introductionmentioning

confidence: 99%

Synthesis of Polycrystalline Diamond Films in Microwave Plasma at Ultrahigh Concentrations of Methane

et al. 2023

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Polycrystalline diamond (PCD) films are usually grown by chemical vapor deposition (CVD) in hydrogen–methane mixtures. The synthesis conditions determine the structure and quality of the grown material. Here, we report the complex effect of the microwave plasma CVD conditions on the morphology, growth rate and phase composition of the resulting PCD films. Specifically, we focus on the factors of (i) increased methane concentrations (νc) that are varied over a wide range of 4%–100% (i.e., pure methane gas) and (ii) substrate temperatures (Ts) varied between 700–1050 °C. Using scanning electron microscopy, X-ray diffraction and Raman spectroscopy, we show that diamond growth is possible even at ultrahigh methane concentrations, including νc = 100%, which requires relatively low synthesis temperatures of Ts < 800 °C. In general, lower substrate temperatures tend to facilitate the formation of higher-quality PCD films; however, this comes at the cost of lower growth rates. The growth rate of PCD coatings has a non-linear trend: for samples grown at Ts = 800 °C, the growth rate increases from 0.6 µm/h at νc = 4% to 3.4 µm/h at νc = 20% and then falls to 0.6 µm/h at νc = 100%. This research is a step toward control over the nature of the CVD-grown PCD material, which is essential for the precise and flexible production of diamond for various applications.

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Plateholder design for deposition of uniform diamond coatings on WC-Co substrates by microwave plasma CVD for efficient turning application

Cited by 27 publications

References 22 publications

Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD

Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD

Combined HF+MW CVD Approach for the Growth of Polycrystalline Diamond Films with Reduced Bow

Synthesis of Polycrystalline Diamond Films in Microwave Plasma at Ultrahigh Concentrations of Methane

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